臺灣博碩士論文加值系統

太陽能作為一種可再生的能源來源，被認為是減緩全球暖化的關鍵之一，光熱轉換技術是利用太陽能的輻射能量，通過吸收光能並轉換為熱能，在能源供應及環境永續性中具有廣泛應用的潛力。
氧化鎢(WOx)薄膜由於其固有的高吸收特性在光譜選擇性吸收膜(Spectral Selective Absorbing Coating，SSAC)方面獲得了廣泛關注，本實驗利用反應式磁控濺鍍系統在玻璃、銅及矽基板上製備W與WOx膜，能量散射光譜儀(EDS)成分分析顯示，WOx薄膜中的氧含量隨沉積過程中氧通量的增加而增加；X光繞射分析儀(XRD)、拉曼光譜儀分析結果證實，薄膜結構從純金屬W薄膜的Cubic-W(c-W)相，隨著氧通量增加依序改變為Monoclinic-WO2相、Tetragonal-WO3-x相、Monoclinic- WO3相；使用紫外光/可見光/近紅外光光譜儀(UV/Vis/NIR)量測其光學性質，隨著氧含量增加，穿透率從0.02 %提升至84.30 %、反射率從76.50 %降低至23.99 %，薄膜的金屬特性降低，介電特性增加，穿透率與反射率結果相一致表明，材料由金屬向介電屬性轉變的過程中，光學特性發生了相對的改變。
Cu/WO(75.7)/W/WO(75.7)/SiO2選擇性吸收體具吸收率0.90及熱輻射率0.04，藉由調整SiO2厚度製備紫、靛、藍、青及綠色之彩色吸收體。將Cu/WO(75.7)/W/WO(75.7)/SiO2與Cu/W/WO(75.7)/W/WO(75.7)/SiO2吸收體分別於大氣及真空環境中進行熱穩定性能測試，Cu/WO(75.7)/W/WO(75.7)/SiO2於大氣300 ˚C及真空500 ˚C持溫兩小時後失效，表面出現氧化銅析出物，Cu/W/WO(75.7)/W/WO(75.7)/SiO2於大氣中可穩定至500 ˚C、真空中600 ˚C，顯示增加阻障層W可改善吸收體之熱穩定性。

Solar energy, as being a renewable energy source, is considered to be one of the key solutions to mitigate global warming. Technology of solar-thermal conversion can convert solar energy into heat energy, exhibiting significant potential in the application of energy supply and environmental sustainability.
Tungsten oxide (WOx) thin films have received significant attention for their inherent high absorption characteristics in Spectral Selective Absorbing Coating (SSAC) applications. In this experiment, W and WOx films were prepared on glass, copper, and silicon substrates by reactive magnetron sputtering system. Energy Dispersive X-ray Spectroscopy (EDS) analysis showed an increase in oxygen content in the WOx films with an increase in oxygen flux during the deposition process. X-ray Diffraction (XRD) and Raman spectroscopy analyses showed that the film structure transitioned from the Cubic-W (c-W) phase of pure metallic W to Monoclinic-WO2, Tetragonal-WO3-x, and finally to Monoclinic-WO3 phases with increasing oxygen flux. The optical properties of the WOx films were characterized using UV/Vis/NIR spectroscopy, and the results showed an increase in transmittance from 0.02% to 84.30% and a decrease in reflectance from 76.50% to 23.99% with increasing oxygen content. The decrease in metallic properties and increase in dielectric properties of the films were consistent with the observed changes in transmittance and reflectance, indicating a transition from metallic to dielectric behavior during the transformation process.
The selective absorber Cu/WO(75.7)/W/WO(75.7)/SiO2 exhibited an absorptance of 0.90 and an emittance of 0.04. By adjusting the SiO2 layer thickness, colored absorbers in purple, indigo, blue, cyan, and green were fabricated. The thermal stability of the Cu/WO(75.7)/W/WO(75.7)/SiO2 and Cu/W/WO(75.7)/W/WO(75.7)/SiO2 absorbers was tested in both ambient and vacuum environments. The Cu/WO(75.7)/W/WO(75.7)/SiO2 absorber failed after being held at 300 ˚C in ambient conditions and 500 ˚C in vacuum conditions, with the appearance of copper oxide precipitates on the surface. In contrast, the Cu/W/WO(75.7)/W/WO(75.7)/SiO2 absorber remained stable up to 500 ˚C in ambient conditions and 600 ˚C in vacuum conditions, indicating that the addition of the barrier W layer can improve the thermal stability of the absorber.

摘要...i
ABSTRACT...iii
誌謝...v
目錄...vi
表目錄...x
圖目錄...xii
第一章、緒論...1
1.1前言...1
1.2研究動機...2
第二章、文獻探討...4
2.1太陽能選擇性吸收體...4
2.1.1太陽光譜...4
2.1.2 黑體輻射...5
2.1.3太陽能選擇性吸收體之光學性質...7
2.2太陽能選擇性吸收膜之種類...9
2.2.1本質型吸收膜 (Intrinsic Absorbing Coatings)...10
2.2.2介電質-金屬-介電質 (Dielectric-Metal-Dielectric，DMD)堆疊型吸收膜...11
2.2.3金屬陶瓷吸收膜 (Ceramic Absorbing Coatings)...12
2.2.4 表面結構型吸收膜 (Textured surface Absorbing Coatings)...12
2.3 鍍膜材料...15
2.3.1過渡族金屬...15
2.3.2氧化鎢...15
2.3.3氧化矽...17
2.4物理氣相沉積 (PHYSICAL VAPOR DEPOSITION, PVD)...17
2.4.1濺鍍法 (Sputtering) 18
2.4.2直流濺鍍 (DC Sputtering )原理...20
2.4.3射頻濺鍍 (RF Sputtering)原理...21
2.5彩色太陽能選擇性吸收體...21
2.5.1 CIE色度...23
第三章、實驗步驟及儀器介紹...27
3.1實驗材料...27
3.1.1靶材...27
3-1-2 基板...27
3-1-3 化學藥品...28
3-1-4 氣體...28
3.2實驗儀器與分析儀器...29
3.2.1反應式磁控濺鍍系統 (Reactive Magnetron Sputter System)...29
3.2.2場發射掃描式電子顯微鏡 (FE-SEM, Field Emission Scanning Electron Microscope)...30
3.2.3能量散射光譜儀 (EDS, Energy Dispersive Spectroscope)...30
3.2.4 X光繞射分析儀 (XRD, X-ray Diffraction)...31
3.2.5拉曼光譜儀(Raman Spectrometer)...32
3.2.6紫外光/可見光/近紅外光光譜儀 (UV/Vis/NIR Spectrophotometer)...33
3.2.7傅立葉轉換紅外線 (FTIR, Fourier Transform Infrared Spectroscopy)...34
3.2.8橢圓偏光儀 (Ellipsometer)...35
3.2.9四點探針 (Four-Point Probe,FPP)...36
3.2.10薄膜光學軟體...37
3.3實驗製程...38
3.3.1基板前處理...38
3.3.2 W、WOx、SiO2薄膜製備...39
3.3.3熱穩定測試...41
3.4實驗流程...42
第四章、結果與討論...43
4.1 W與WOX單層膜之製備及性質探討...43
4.1.1 W與WOx之成份分析...43
4.1.2 W與WOX之XRD結構分析...44
4.1.3 W與WOX之拉曼光譜分析...49
4.1.4 W與WOX之光學性質分析...52
4.1.5 W與WOX之電性分析...55
4.2 太陽能選擇性吸收體組合膜層...57
4.2.1堆疊膜層參數選定...57
4.2.2 W與WO(75.7)單層膜光學常數...58
4.2.3 DMD堆疊吸收膜之膜層結構與光學性質...59
4.3 藉由改變SIO2厚度製備不同顏色之彩色吸收體...60
4.3.1彩色太陽能選擇性吸收體之膜層結構與光學性質...62
4.4 太陽能選擇性吸收體熱穩定性能探討...73
4.4.1 大氣熱穩定測試...74
4.4.2真空熱穩定測試...92
第五章、結論...109
參考文獻...110
EXTENDED ABSTRACT...118

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