臺灣博碩士論文加值系統

本篇研究是使用射頻磁控濺鍍系統沉積氧化鋅與銅摻雜氧化鋅薄膜於玻璃基板上，再使用黃光微影製程製作線寬10μm的指叉狀電極，使其成為表面聲波元件，最後透過向量網路分析儀量測表面聲波元件之頻率響應，觀察其頻寬、插入損耗、相位與中心頻率之變化。
為了探討其特性，使用了紫外光感測器方式，在表面聲波元件上使用固定溶液濃度的水熱法成長不同時間之奈米柱，並運用254nm與365nm之波長紫外光，觀察表面聲波元件上不同時間之奈米柱的變化量，將照光結果來進行比較。最後透過X光繞射分析儀、場發射掃描式電子顯微鏡來觀察奈米柱的表面型態與晶體結構。

In this study, a RF magnetron sputtering system was used to deposit zinc oxide (ZnO) and copper doped zinc oxide (ZnO:Cu) films on a glass substrate. The deposited films are then lithographed to form surface acoustic wave (SAW) elements with 10 μm line widths of interdigital transducers (IDTs). Finally, the frequency response of the SAW components was measured by a vector network analyzer (VNA) to observe the variation of bandwidth, insertion loss, phase, and center frequency.
In order to investigate the characteristics, a UV sensor method was used. The nanorods were grown on the SAW elements for different times by hydrothermal method with fixed solution concentration. The UV light of 254nm and 365nm wavelengths was used to observe the change of the illumination of the nanorods on the SAW element at different times, and the illumination results were compared.
Finally, the surface morphology and crystalline structure of the nanorods were observed by X-ray diffraction analysis (XRD) and field emission scanning electron microscopy (FE-SEM).

摘要....i
Abstract....ii
誌謝....iii
目錄....iv
表目錄....vi
圖目錄....vii
第一章、 緒論....1
1.1前言....1
1.2本文架構....2
1.3研究動機....2
第二章、 基礎理論....3
2.1氧化鋅....3
2.2氧化鋅薄膜沉積方式....5
2.2.1薄膜沉積方式....5
2.2.2磁控濺鍍法原理....5
2.2.3薄膜成長機制....6
2.3氧化鋅奈米柱成長方式....7
2.3.1水熱法(hydrothermal method)....7
2.4壓電效應....8
2.4.1正壓電效應....8
2.4.2逆壓電效應....8
2.4.3壓電材料....9
2.4.4壓電基板的特性....9
2.5表面聲波元件之概述....10
2.5.1表面聲波....10
2.5.2表面聲波元件....11
2.5.3表面聲波元件相關參數....12
2.5.4聲波波速與中心頻率....12
2.5.5插入損耗(Insertion loss,IL)....12
2.5.6機電耦合常數(Electromechanical Coupling Coefficient, K2)....12
2.5.7溫度頻率係數(Temperature Coefficients of frequency,TCF)....13
2.6 紫外光感測原理....14
第三章、 實驗步驟與分析....15
3.1實驗架構....15
3.2實驗前準備....16
3.2.1氧化鋅靶材製作....16
3.2.2 銅摻雜氧化鋅靶材製作....16
3.2.3基板清潔....17
3.3表面聲波元件製備....18
3.3.1薄膜濺鍍....18
3.3.2黃光微影製程....20
3.4氧化鋅奈米柱生長....23
3.5實驗分析儀器與量測分法....25
3.5.1場發射型掃描式電子顯微鏡（Field Emission Scanning Electron Microscope , FE-SEM）....25
3.5.3 向量網路分析儀（Vector Network Analyzers , VNA）....26
3.5.4 表面聲波元件之紫外光量測方法....26
3.6實驗藥品、耗材及儀器介紹....28
3.6.1實驗藥品及耗材....28
3.6.2實驗儀器....29
第四章、 結果與討論....30
4.1物理特性分析....30
4.1.1成長在銅摻雜氧化鋅薄膜上的氧化鋅奈米柱形貌分析....30
4.2表面聲波元件的測量....37
4.3表面聲波元件之紫外光感測器的測量....48
第五章、 結論....55
參考文獻....56
Extended Abstract....60

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