臺灣博碩士論文加值系統

本研究使用物理氣相沉積中的電子束真空鍍膜技術及射頻磁控濺射技術將多元合金Fe41Co17Ni28Ti1.25Al11.5Nb1.25製備成薄膜，電子束鍍膜功率設定為儀器最大功率的55%，真空度為4×10-3torr，磁控濺鍍功率設定為100W、150W、200W，真空度為8x10-6torr藉由不同熱處理之多元合金及薄膜厚度來觀察其在不同條件下的成分、晶體結構及性質是否有不同的表現。實驗分析利用原子力顯微鏡量測薄膜的膜厚及表面粗糙度、掃描式電子顯微鏡觀察薄膜的表面形貌並對比不同厚度之間的差異、能量散射光譜儀分析薄膜之成分分布、X光繞射儀分析晶體結構的差異，最後利用交替是梯度測磁儀來分析薄膜的磁性質。

In this study, the multi-element alloy Fe41Co17Ni28Ti1.25Al11.5Nb1.25 was prepared into thin films by electron beam vacuum coating technology and radio frequency magnetron sputtering technology in physical vapor deposition. The electron beam coating power was set at 55% of the maximum power of the instrument, and the vacuum degree The magnetron sputtering power is set to 100W, 150W, 200W, and the vacuum degree is 8x10-6 torr to observe the composition, crystal structure and Whether the properties behave differently. Experimental analysis uses an atomic force microscope to measure the film thickness and surface roughness of the film, a scanning electron microscope to observe the surface morphology of the film and compare the differences between different thicknesses, an energy scatter spectrometer to analyze the composition distribution of the film, and an X-ray diffractometer to analyze Finally, the magnetic properties of the thin film were analyzed by alternating gradient magnetometer.

摘要..........i
Abstract..........ii
誌謝..........iii
目錄..........iv
圖目錄..........ix
表目錄..........xii
第一章緒論..........1
1.1前言..........1
1.2研究動機與目的..........2
第二章理論基礎..........3
2.1金屬..........3
2.2合金..........3
2.3多元合金..........3
2.4高熵合金(High-Entropy Alloys, HEA)..........4
2.5磁性質..........5
2.6磁性材料..........5
2.6.1鐵磁性 (Ferromagnetism)..........5
2.6.2亞鐵磁性(Ferrimagnetism)..........5
2.6.3順磁性(Paramagnietic)..........6
2.6.4反鐵磁性(Antiferromagnetism)..........6
2.6.5反磁性(Diamagnetism)..........7
2.6.7居禮溫度（Curie Temperature, TC）..........7
2.6.8尼爾溫度(Néel Temperature, TN)..........7
2.7磁滯現象..........8
2.7.1磁化率(Magnetic Susceptibility)..........9
2.7.2飽和磁化強度(Saturation Mgnetization, MS)..........9
2.7.3矯頑磁力(Coercivity, HC)..........9
2.8磁異向性(Magnetic anisotropy)..........10
2.8.1磁晶異向性(Magnetocrystalline anisotropy)..........10
2.8.2形狀異向性(Shape anisotropy)..........10
2.8.3交換異向性(Exchange anisotropy)..........10
2.8.4應力異向性(Stress anisotropy)..........10
2.9物理氣相沉積法(Physical Vapor Deposition, PVD)..........11
2.9.1濺鍍(Sputtering)..........11
2.9.2蒸鍍(Evaporation)..........11
2.9.3蒸鍍薄膜沉積原理..........14
2.10儀器分析原理..........16
2.10.1掃1描1式1電1子1顯1微1鏡 (Scanning Electron Microscope, SEM)..........16
2.10.2能量散射光譜儀（Energy Dispersive Spectrometer , EDS）..........16
2.10.3X光繞射儀(X-ray Diffractometer , XRD )..........16
2.10.4薄膜厚度輪廓測量儀 (α-step)..........17
2.10.5磁光柯爾效應(Magneto Optical Kerr Effect, MOKE)..........17
2.10.6振動樣品磁強計(Vibrating-Sample Magnetometer, VSM)..........18
2.10.7超導量子干涉儀(Superconducting QUantum Interference Device Vibrating Sample Magnetometer, SQUID-VSM)..........19
2.10.8交替式梯度測磁儀 (Alternating Grandient Magnetometer, AGM)..........19
2.11文獻回顧..........21
2.11.1FeCrCoMnNi高熵合金雷射3D列印..........21
2.11.2AlCoFeMnNi高熵合金的熱穩定性..........23
2.11.3FeCoNiTi基高熵合金的合成、表徵及磁性能..........24
第三章實驗方法與流程..........26
3.1實驗材料..........26
3.2實驗流程圖..........26
3.2.1靶材準備..........27
3.2.2基板準備..........27
3.3實驗設計..........28
3.4鍍率量測..........28
3.5實驗設備..........28
3.5.1 電子東真空鍍膜機..........28
3.5.2磁控濺鍍機..........29
3.6實驗分析儀器..........30
3.6.1 X繞射分析儀(X-ray diffraction, XRD)..........30
3.6.2掃描式電子顯微鏡(Scanning Electron Microscope)..........30
3.6.3交替式梯度測磁儀 (Alternating Grandient Magnetometer, AGM)..........32
第四章結果與討論..........33
4.1FeCoNiTiAlNb合金蒸鍍薄膜表面形貌分析..........33
4.1.1蒸鍍-5nm薄膜..........33
4.1.2蒸鍍-10nm薄膜..........34
4.1.3蒸鍍-15nm薄膜..........34
4.1.4蒸鍍-20nm薄膜..........35
4.2FeCoNiTiAlNb合金蒸鍍薄膜成分分析..........36
4.2.1蒸鍍-5nm薄膜..........36
4.2.2蒸鍍-10nm薄膜..........39
4.2.3蒸鍍-15nm薄膜..........42
4.2.4蒸鍍-20nm薄膜..........45
4.2.5蒸鍍薄膜綜合成分分析..........48
4.3FeCoNiTiAlNb合金蒸鍍薄膜晶體結構分析..........51
4.3.1蒸鍍-5nm薄膜..........51
4.3.2蒸鍍-10nm薄膜..........51
4.3.3蒸鍍-15nm薄膜..........52
4.3.4蒸鍍-20nm薄膜..........53
4.3.5蒸鍍薄膜綜合晶體結構分析..........53
4.4FeCoNiTiAlNb合金蒸鍍薄膜磁性質分析..........54
4.4.1蒸鍍-5nm薄膜..........54
4.4.2蒸鍍-10nm薄膜..........55
4.4.3蒸鍍-15nm薄膜..........56
4.4.4蒸鍍-20nm薄膜..........57
4.4.5蒸鍍薄膜綜合磁性質分析..........58
4.5 FeCoNiTiAlNb合金濺鍍薄膜表面形貌分析..........59
4.5.1濺鍍100W-20nm薄膜..........59
4.5.1濺鍍150W-20nm薄膜..........60
4.5.1濺鍍200W-20nm薄膜..........61
4.5.2濺鍍150W-10nm薄膜..........62
4.5.3濺鍍150W-40nm薄膜..........63
4.6 FeCoNiTiAlNb合金濺鍍薄膜成分分析..........64
4.6.1濺鍍100W-20nm薄膜..........64
4.6.2濺鍍150W-20nm薄膜..........66
4.6.3濺鍍200-20nm薄膜..........69
4.6.4濺鍍不同瓦數-20nm薄膜成分分析..........71
4.6.5濺鍍150W-10nm薄膜..........73
4.6.6濺鍍150W-40nm薄膜..........75
4.6.7濺鍍150W不同膜厚成分分析..........78
4.7 FeCoNiTiAlNb合金濺鍍薄膜晶體結構分析..........80
4.7.1濺鍍100W-20nm薄膜..........80
4.7.2濺鍍150W-20nm薄膜..........81
4.7.3濺鍍200W-20nm薄膜..........81
4.7.4濺鍍不同瓦數-20nm薄膜晶體結構分析..........82
4.7.5濺鍍150W-10nm薄膜..........83
4.7.6濺鍍150W-40nm薄膜..........83
4.7.7濺鍍150W不同膜厚晶體結構分析..........84
4.8 FeCoNiTiAlNb合金濺鍍薄膜磁性質分析..........84
4.8.1濺鍍100W-20nm薄膜..........84
4.8.2濺鍍150W-20nm薄膜..........85
4.8.3濺鍍200W-20nm薄膜..........87
4.8.4濺鍍不同瓦數-20nm薄膜磁性質分析..........88
4.8.5濺鍍150W-10nm薄膜..........88
4.8.6濺鍍150W-40nm薄膜..........89
4.8.7濺鍍150W不同膜厚磁性質分析..........90
第五章結論..........92
參考資料..........93
Extended Abstract..........95

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