臺灣博碩士論文加值系統

總目錄
摘要 I
Abstract II
致謝 III
總目錄 IV
表目錄 VII
圖目錄 IX
第1章 緒論 1
1.1氮化物 1
1.2溶膠-凝膠法 2
1.3鍍膜技術 3
1.4電漿簡介與原理 5
1.5研究動機 11
第2章 文獻回顧 12
2.1氮化鋁鉻薄膜 12
2.2薄膜製程 13
2.2.1 物理氣相沉積法(Physical Vapor Deposition) 13
2.2.2 射頻濺鍍法(RF) 17
2.2.3常壓電漿氮化法 18
第3章 實驗方法 20
3.1實驗流程 20
3.2前驅液配置 21
3.3塗佈前處理 22
3.4薄膜塗佈 23
3.5微波常壓電漿處理 23
3.6.1 高解析X光繞射分析儀(High Resolution X-Ray Diffratometer, HR-XRD) 25
3.6.2 場發射掃描式電子顯微鏡(Field Emission Scanning Electron Microscope, FE-SEM) 26
3.6.3 霍爾效應量測系統(Hall Effect Measurement System) 28
第4章 結果與討論 29
4.1 退火溫度之差異 29
4.2 X光繞射分析 32
4.2.1 Cr1-xAlxN薄膜不同Al濃度之影響 32
4.2.2 Cr1-xAlxN純相薄膜之特徵峰角度分析 47
4.2.3 TOPAS晶格分析 51
4.3 電子顯微鏡分析 55
4.3.1 Cr1-xAlxN薄膜之分析 55
4.3.2 EDS元素分析 72
4.4 霍爾效應之電性分析 73
第5章 結論 78
參考文獻 81

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