臺灣博碩士論文加值系統

　　本論文研究總共分為兩部個分，第一部分利用射頻磁控濺鍍系統沉積氧化釔(Yttrium oxide, Y2O3)和氧化鎂(Magnesium oxide, MgO)混合而成的氧化釔-氧化鎂(Y2O3-MgO,YM)奈米複合薄膜，透過改變不同MgO含量比例(分別為20、40和60%)，探討微結構與機械性質變化。隨著MgO含量的增加，原本YM奈米複合薄膜的柱狀生長結構被改變為奈米結構，當Y2O3:MgO的比例為40%:60%時，由於Y2O3與MgO的熱力學不相容性質，使Y2O3與MgO晶粒彼此推擠，產生釘扎效應(Pinning effect)，阻礙了Y2O3與MgO彼此的晶粒成長，因此得到有效的晶粒細化效果。利用奈米壓痕分析結果得出，YM 奈米複合薄膜機械性質顯著增強，硬度和楊式模數最大值分別為16.78 ± 0.8和149.24 ± 4.7 GPa。在經過四氟化碳/氧 (CF4/O2)電漿蝕刻後，由X射線光電子能譜分析結果顯示YM奈米複合薄膜電漿蝕刻後表層的元素和化學組成幾乎沒有變化，證實了YM奈米複合薄膜的化學穩定性，由α-step量測得到的蝕刻深度顯示，機械性質強化後的YM奈米複合薄膜比Y2O3薄膜更耐蝕刻。
　　而第二部分探討YM奈米複合薄膜的氟化行為，透過FE-SEM圖像結果顯示，經由CF4/O2電漿蝕刻的Y2O3薄膜具有特定晶面被蝕刻，導致部分氟原子滲透到材料內部，形成較不均勻的厚氟化層，而YM奈米複合薄膜具有高度緻密的柱狀結構和細晶粒奈米複合材料，在電漿蝕刻的樣品表面形成均勻的氟化層，證實了YM奈米複合薄膜，在電漿蝕刻環境中有較高的化學穩定性。

The effect of Y2O3: MgO ratio on the microstructures, mechanical properties, and plasma erosion behaviors of Y2O3–MgO (YM) nanocomposite films were investigated. The columnar growth structure of the YM nanocomposite film is disrupted as the MgO content increases, resulting in the refinement of the Y2O3 grains. When the Y2O3: MgO ratio is 40 : 60, the columnar crystal structure of the YM nanocomposite film can be refinement effectively due to thermodynamic incompatibility of Y2O3 and MgO. As a result, YM nanocomposite film is strengthened significantly with the maximum hardness and elastic modulus of 16.78 ± 0.8 GPa and 149.24 ± 4.7 GPa, respectively. X-ray photoelectron spectroscopy revealed few changes in the elemental and chemical compositions of the surface layer after fluorination in the YM nanocomposite film, confirming the chemical stability of the YM nanocomposite samples. The etching depth is 1.05 times lower on the YM nanocomposite film (with a MgO content of 60%) than on the commercial Y2O3 film. The findings show that the strengthened YM nanocomposite film is more erosion resistant than the commercial Y2O3 coating.

中文摘要.......................................................................i
Abstract.....................................................................iii
誌謝...........................................................................v
目錄..........................................................................vi
表目錄......................................................................viii
圖目錄........................................................................ix
第一章 緒論.....................................................................1
1.1 前言.......................................................................1
1.2 研究動機...................................................................2
第二章 理論基礎及文獻回顧........................................................7
2.1 材料機械性質強化種類........................................................7
2.1.1 晶粒細化.................................................................7
2.1.2 固溶強化.................................................................7
2.1.3 加工硬化.................................................................8
2.2奈米複合薄膜製備方式.........................................................8
2.2.1 火花電漿燒結法............................................................8
2.2.2 溶膠凝膠法................................................................9
2.2.3 濺鍍系統.................................................................9
2.3 薄膜沉積原理...............................................................11
2.4 電漿蝕刻原理..............................................................12
第三章 實驗流程與儀器介紹.......................................................16
3.1 實驗材料..................................................................16
3.1.1 實驗基板................................................................16
3.1.2 濺鍍靶材................................................................16
3.1.3 製程氣體................................................................16
3.1.4 化學藥品................................................................16
3.2 試片前處理.................................................................17
3.3 實驗樣品製備...............................................................17
3.3.1 Y2O3-MgO(YM)奈米複合薄膜製備.............................................17
3.3.2 四氟化碳/氧(CF4/O2)電漿蝕刻..............................................18
3.4 實驗流程..................................................................19
3.5 分析儀器及原理.............................................................20
3.5.1 穿透式電子顯微鏡.........................................................20
3.5.2 場發射掃描式電子顯微鏡....................................................21
3.5.3 原子力顯微鏡.............................................................22
3.5.4 X-ray繞射分析儀..........................................................23
3.5.5 X-ray光電子能譜儀........................................................24
3.5.6 奈米壓痕測試儀...........................................................25
第四章 實驗結果與討論..........................................................31
4.1 不同氧化鎂含量製備YM奈米複合薄膜特性探討.....................................31
4.2 YM奈米複合薄膜電漿蝕刻氟化行為..............................................37
第五章 結論....................................................................63
參考文獻......................................................................65
Extended Abstract.............................................................70

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