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Colloid surface cleaning can result in scratching, water marks, or incomplete cleaning due to variations in applied force, alcohol concentration, number of wipes, and wiping speed. In this study, the Taguchi Quality method was employed to optimize the parameters for colloid cleaning machines with a wiping force of 3kg, one wipe per stroke, a wiping speed of 30mm/s, and an alcohol concentration of 95%. After verification by the machine, it can be found that the wiping strength and speed are not as high as possible, the scratches or deformation of the product caused by high wiping strength and speed, so the appropriate parameters can reduce the abnormalities through colloidal cleaning. These parameters also effectively reduced surface contamination in manufacturing processes and minimized the time required for manual special operations to address subsequent contamination, thus mitigating the risk of secondary contamination.
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