臺灣博碩士論文加值系統

六氯矽乙烷(Hexachlorodisilane, HCDS)為一種禁水性、腐蝕性、易燃性的透明液體，也是現代半導體製程中重要的原料。HCDS極易與水氣發生水解反應產生鹽酸及氧化矽水解產物，其水解產物具有撞擊敏感性，若處理不慎將導致嚴重的火災爆炸事故。2014年，三菱綜合材料株式會社(MMC)在其高純度多晶矽製造廠內發生嚴重的火災爆炸事故，此事故共造成5人死亡13人受傷，經調查後發現此事故與六氯矽乙烷水解產物之撞擊有關。
本研究分別在氮氣環境的手套箱中使用氫氧化鈉、碳酸鉀、碳酸氫鉀、磷酸鉀、磷酸氫鉀、磷酸二氫鉀、氯化鉀及氨水混和HCDS水解產物並以氮氣乾燥後進行摩擦測試，比較最小摩擦力，探討鹼金族離子及氫氧基離子何者為影響HCDS水解沉積物之摩擦敏感性主要因素。結果表明加入鹼金族離子的HCDS水解產物最小摩擦力從252 N降低至180 N；而加入氫氧基離子的HCDS水解產物最小摩擦力從252 N至360 N；且鹼金族離子在強鹼中的HCDS水解產物最小摩擦力從252 N降低至8 N；鹼金族離子在弱鹼的HCDS水解產物最小摩擦力從252 N降低至160 N。因此鹼金族離子為增加HCDS水解產物摩擦敏感性的主要因素，且當有鹼金族離子存在、同時pH值越高，HCDS水解產物之摩擦敏感性則為最大。

Hexachlorodisilane (HCDS) is a transparent liquid that is water-reactive, corrosive and flammable, and is an important raw material in modern semiconductor manufacturing processes. HCDS is easily hydrolyzed with water vapor to produce hydrochloric acid and silicon oxide hydrolyzed products. The hydrolyzed products are sensitive to impact, and if handled improperly, it may cause serious fire and explosion accidents. In 2014, Mitsubishi Materials Corporation in Japan suffered a serious fire and explosion accident in its high-purity polysilicon manufacturing plant. The accident caused 5 deaths and 13 injuries. After investigation, it was discovered that the accident was related to impact of hydrolyzed products containing HCDS.
In this study, sodium hydroxide, potassium carbonate, potassium bicarbonate, potassium phosphate, potassium hydrogen phosphate, potassium dihydrogen phosphate, potassium chloride, and ammonia water solution were mixed with HCDS hydrolyzed deposits in a glove box in a nitrogen environment, and dry it with nitrogen for friction ignition tests to explore which of the alkali metal ions and hydroxide ions are the main factors affecting the friction sensitivity of HCDS hydrolyzed deposits. The results show that the lowest friction force (LFF) of HCDS hydrolyzed deposits with alkali metal ions decreased from 252 N to 180 N; while the LFF of HCDS hydrolyzed deposits with hydroxide ions increased from 252 N to 360 N. In addition, the LFF of the HCDS hydrolyzed deposits with alkali metal ions in a strong base is reduced from 252 N to 8 N. The LFF of HCDS hydrolyzed deposits with alkali metal ions in a weak base is reduced from 252 N to 160 N. Therefore, alkali metal ions are the main factor to increase the friction sensitivity of HCDS hydrolyzed deposits. In the presence of both alkali metal ions and higher the pH value, the friction sensitivity of HCDS hydrolyzed deposits is the highest.

摘要
ABSTRACT
誌謝
目錄
表目錄
圖目錄
第壹章 緒論
1.1 研究背景與動機
1.2 研究目的
第貳章 文獻回顧
2.1 六氯矽乙烷水解沉積物之特性及特徵峰
2.2 六氯矽乙烷水解沉積物之水解與撞擊反應機制
2.3 HCDS混合鹼性溶液之影響
第參章 研究方法與材料
3.1 研究架構
3.2 研究方法
3.2.1 實驗規劃
3.2.2 實驗配置
3.2.3 實驗方法
3.3 研究器材與設備
第肆章 結果與討論
4.1 摩擦敏感性測試
4.1.1 氯化鉀及氨水/HCDS水解沉積物之摩擦敏感性測試
4.1.2 強鹼鹼金族離子溶液/HCDS水解沉積物之摩擦敏感性測試
4.1.3 弱鹼鹼金族離子溶液/HCDS水解沉積物之摩擦敏感性測試
4.1.4 強鹼鹼土族離子溶液/HCDS水解沉積物之摩擦敏感性測試
4.1.5 HCDS水解沉積物之摩擦敏感性測試
4.2 官能基分析
4.2.1 氯化鉀及氨水/HCDS水解沉積物之官能基分析
4.2.2 強鹼鹼金族離子溶液/HCDS水解沉積物之官能基分析
4.2.3 弱鹼鹼金族離子溶液/HCDS水解沉積物之官能基分析
4.2.4 強鹼鹼土族離子溶液/HCDS水解沉積物之官能基分析
4.3 氫氣釋放量
4.3.1 氯化鉀、氨水/HCDS水解沉積物之氫氣釋放量
4.3.2 強鹼鹼金族離子溶液/HCDS水解沉積物之氫氣釋放量
4.3.3 弱鹼鹼金族離子溶液/HCDS水解沉積物之氫氣釋放量
4.3.4 強鹼鹼土族離子溶液/HCDS水解沉積物之氫氣釋放量
4.4 熱分解後的官能基分析
第伍章 結論
5.1 摩擦敏感性
5.2 官能基分析
5.3 氫氣釋放量
5.4 熱分解後的官能基分析
參考文獻

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