總目錄
摘要 ii
ABSTRACT iii
誌謝 iv
總目錄 vii
表目錄 x
圖目錄 xi
第1章 緒論 1
1.1氮化鋯 1
1.2電漿原理 3
1.3生物相容性 4
1.4研究動機 5
第2章 文獻回顧 7
2.1氮化鋯的製備 7
2.1.1熱氮化處理 8
2.1.2 氮化鋯薄膜製程 8
第3章 實驗方法 11
3.1實驗流程圖 11
3.2鋯基材前處理 12
3.3大氣電漿系統及氮化條件 13
3.4分析儀器及原理 15
3.4.1 X光繞射儀 15
3.4.2光學顯微鏡 17
3.4.3場發射掃描式電子顯微鏡 19
3.4.4 微小維式硬度計 21
3.4.6 X光光電能譜儀 23
3.5.7 電化學分析及電極系統 24
3.5.8細胞存活實驗 26
第4章 結果與討論 28
4.1大氣電漿之溫度測量 28
4.2 X光繞射分析 30
4.3晶格常數分析 33
4.4表面形貌結構分析 47
4.4.1 生成機制的探討 52
4.5機械性質分析 54
4.6 X光光電能譜儀分析 57
4.7抗腐蝕實驗 61
4.8細胞相容性 64
第5章 結論 66
參考文獻 68

表目錄
表1.1氮化鋯與氮化鈦性質比較 2
表4. 1各條件擬合之晶格常數 35
(續)表4.1 各條件擬合之晶格常數 36
表4.2各條件擬合之晶格常數 42
(續)表4.2各條件擬合之晶格常數 43
表4.3 經過各條件電漿轟擊過後樣品在BES模式下之測量厚度 48
表4.5 經過各條件電漿轟擊過後樣品之硬度值 55
表4.6鋯之化合物X光光電能譜可能出現之範圍 58
表4.7 各條件之塔弗曲線相關數據 63

圖目錄
圖1.1氮化鋯之晶格結構 2
表1.1氮化鋯與氮化鈦性質比較[1] 2
圖3.1實驗流程圖 11
圖3.2 微波大氣電漿系統示意圖 14
圖3.3 三極式電解槽示意圖 25
圖4.1大氣電漿系統在不同轟擊距離之溫度變化圖 29
圖4.2鋯基材經過大氣電漿不同轟擊距離之XRD圖譜： 32
轟擊時間(A)5 MIN、(B)10 MIN 32
圖4.3經大氣電漿以不同轟擊距離轟擊過後試片之TOPAS擬合結果 34
轟擊時間5 MIN 34
圖4.4轟擊時間為5 MIN，各轟擊距離之晶格常數變化：(A)ZRN之A值、 39
(B)T-ZRO2之A與C值、(C)M-ZRO2之A與B值、(D) M-ZRO2之C值 39
圖4.5經大氣電漿以不同轟擊距離轟擊過後樣品之TOPAS擬合結果 41
(轟擊時間10 MIN) 41
圖4.6 轟擊時間為10MIN，各轟擊距離之晶格常數變化：(A)ZRN之A值、 46
(B)T-ZRO2之A與C值、(C)M-ZRO2之A與B值、(D) M-ZRO2之C值 46
圖4.7 經過各條件電漿轟擊過後樣品利用SEM觀察表面形貌 48
圖4.8 經過各條件電漿轟擊過後樣品利用BES觀察剖面形貌 48
圖4.9 經過各條件電漿轟擊過後樣品利用OM觀察剖面形貌 50
表4. 4 經過各條件電漿轟擊過後樣品OM觀測下之測量厚度 50
圖4.10各條件樣品分別在SME與OM觀察之測量厚度比較 51
圖4.11 將經過電漿轟擊過後之樣品剖面形貌及表面研磨後之形貌 52
圖4.12 比較有無研磨掉樣品黑色表面之XRD圖譜 53
圖4.13各轟擊距離之硬度變化圖：轟擊時間：5 MIN VS 10 MIN 56
圖4.14 各條件電漿轟擊之樣品(A)ZR-3D、(B)N-1S、(C)O-1S 59
的X光光電能譜圖 59
(續)圖4.14 各條件電漿轟擊之樣品(A)ZR-3D、(B)N-1S、(C)O-1S 60
的X光光電能譜圖 60
圖4.15 各條件電漿轟擊於3.5 WT%的NACL水溶液之塔弗曲線 62
圖4.16 改變大氣電漿轟擊距離的樣品細胞存活率圖 65
：轟擊時間5 MIN 65
圖4.17 改變大氣電漿轟擊距離的樣品細胞存活率圖 65
：轟擊時間10 MIN 65

[1] H.O. Pierson, Handbook of refractory carbides and nitrides, Noyes Publications, (1996).
[2] J. Yi, Q. Miao, W. Liang, Y. Liu, Y. Qi, Z. Ding, X. Xu, H. Ma, Y. Sun, A functionally graded coating from ZrN to Ti: Experimental characterization, erosion behavior and design concept, Surface and Coatings Technology, 432 (2022).
[3] D.F. Zambrano, R. Hernández-Bravo, A. Ruden, D.G. Espinosa-Arbelaez, J.M. González-Carmona, V. Mujica, Mechanical, tribological and electrochemical behavior of Zr-based ceramic thin films for dental implants, Ceramics International, 49 (2023) 2102-2114.
[4] X. Yao, H. Huo, M. Bao, L. Tian, Impact fatigue behavior of ZrN/Zr-N/Zr coatings on H13 steel by CFUBMSIP, Journal of Wuhan University of Technology-Mater. Sci. Ed., 29 (2014) 137-142.
[5] Y. Luo, L. Pu, G. Wang, Y. Zhao, RF Energy Harvesting Wireless Communications: RF Environment, Device Hardware and Practical Issues, Sensors (Basel), 19 (2019).
[6] L. Gu, Y. Zhu, G. He, A. Farhadi, W. Zhao, Coupled numerical simulation of arc plasma channel evolution and discharge crater formation in arc discharge machining, International Journal of Heat and Mass Transfer, 135 (2019) 674-684.
[7] V. Hohreiter, J.E. Carranza, D.W. Hahn, Temporal analysis of laser-induced plasma properties as related to laser-induced breakdown spectroscopy, Spectrochimica Acta Part B-Atomic Spectroscopy, 59 (2004) 327-333.
[8] S. Tiwari, A. Caiola, X. Bai, A. Lalsare, J.L. Hu, Microwave Plasma-Enhanced and Microwave Heated Chemical Reactions, Plasma Chemistry and Plasma Processing, 40 (2020) 1-23.
[9] X.Y. Zhang, Y.H. Zhao, W.W. Gao, L. Ren, K. Yang, Study of TiCuN/ZrN multilayer coatings with adjustable combination properties deposited on TiCu alloy, Vacuum, 202 (2022).
[10] H.Y. Chen, W.H. Yang, Chromium nitride thin films prepared using atmospheric pressure plasma process, Thin Solid Films, 706 (2020).
[11] H.Y. Chen, C.H. Wu, Preparation of Aluminum Nitride Thin Film on Aluminum Alloy by Atmospheric Pressure Plasma Process, (2021).
[12] H.Y. Chen, Z.Y. Xia, Preparation and Characterization of Ternary Chromium Aluminum Nitride Film with Atmospheric Pressure Plasma, (2021).
[13] H.Y. Chen, Y.X. Chen, Nitridation of titanium substrate with atmospheric pressure plasma processing, (2022).
[14] N.C. Reger, V.K. Balla, M. Das, A.K. Bhargava, Wear and corrosion properties of in-situ grown zirconium nitride layers for implant applications, Surface & Coatings Technology, 334 (2018) 357-364.
[15] C.Q. Xia, Q.Y. Liu, T.S. Song, B.H. Chen, S.G. Liu, Q. Li, Corrosion behavior and wear resistance of Zr-2.5Nb alloy after thermal oxy-nitriding treatment, Surface & Coatings Technology, 446 (2022).
[16] H. Jimenez, E. Restrepo, A. Devia, Effect of the substrate temperature in ZrN coatings grown by the pulsed arc technique studied by XRD, Surface & Coatings Technology, 201 (2006) 1594-1601.
[17] M.M. Larijani, M. Elmi, M. Yari, M. Ghoranneviss, P. Balashabadi, A. Shokouhy, Nitrogen effect on corrosion resistance of ion beam sputtered nanocrystalline zirconium nitride films, Surface & Coatings Technology, 203 (2009) 2591-2594.
[18] P. Prachar, S. Bartakova, V. Brezina, L. Cvrcek, J. Vanek, Cytocompatibility of implants coated with titanium nitride and zirconium nitride, Bratislava Medical Journal-Bratislavske Lekarske Listy, 116 (2015) 154-156.
[19] A. Pogrebnjak, V. Ivashchenko, O. Bondar, V. Beresnev, O. Sobol, K. Zaleski, S. Jurga, E. Coy, P. Konarski, B. Postolnyi, Multilayered vacuum-arc nanocomposite TiN/ZrN coatings before and after annealing: Structure, properties, first-principles calculations, Materials Characterization, 134 (2017) 55-63.
[20] H. Iwata, H. Ishii, D. Kato, S. Kawashima, K. Kodama, M. Furusawa, M. Tanaka, T. Sekiya, Deposition of ZrON thin films by reactive magnetron sputtering using a hollow cylindrical target, Journal of Vacuum Science & Technology A, 36 (2018).
[21] A. Rizzo, D. Valerini, L. Capodieci, L. Mirenghi, F. Di Benedetto, M.L. Protopapa, Reactive bipolar pulsed dual magnetron sputtering of ZrN films: The effect of duty cycle, Applied Surface Science, 427 (2018) 994-1002.
[22] J.H. Huang, K.L. Kuo, G.P. Yu, Oxidation behavior and corrosion resistance of vacuum annealed ZrN-coated stainless steel, Surface & Coatings Technology, 358 (2019) 308-319.
[23] C.Y. Wu, J.H. Chen, C.G. Kuo, M.J. Twu, S.W. Peng, C.Y. Hsu, Effects of deposition parameters on the structure and properties of ZrN, WN and ZrWN films, Bulletin of Materials Science, 42 (2019).