臺灣博碩士論文加值系統

總目錄
摘要 i
Abstract ii
誌謝 iv
總目錄 v
表目錄 viii
圖目錄 ix
第一章 緒論 1
1.1氮化物 1
1.2 電漿簡介與原理 3
1.3 常壓電漿 5
1.4 研究動機與目的 10
第二章 文獻回顧 11
2.1 滲氮技術 11
2.2 製備氮化鐵薄膜的方法 12
2.2.1常壓電漿處理 12
2.2.2直流輝光放電電漿處理 13
2.2.3直流電弧電漿處理 14
2.2.4反應磁控濺鍍法處理 14
第三章 實驗方法 16
3.1 實驗流程 16
3.2 基材 17
3.3 常壓電漿 17
3.4 薄膜檢測分析及原理 22
3.5分析儀器 22
3.5.1 X光繞射儀(X-ray Diffractometer ,XRD) 23
3.5.2 掃描式電子顯微鏡(Scanning Electron Microscope，SEM) 25
3.5.3能量分散X射線譜儀(Energy-Dispersive X-ray Spectroscopy，EDS) 26
3.5.4 洛氏硬度(Rockwell Hardness ) 27
第四章 結果與討論 28
4.1 光繞射分析 28
4.1.1 不同電漿距離對氮化鐵薄膜的生長影響 28
4.1.2 不同電漿時間對氮化鐵薄膜的生長影響 30
4.1.3 不同電漿瓦數對氮化鐵薄膜的生長影響 32
4.2 電子顯微鏡分析 34
4.2.1 不同電漿轟擊距離及時間的表面形貌分析 34
4.2.2 不同電漿轟擊距離及時間之表面成分分析 37
4.3 洛氏硬度試驗分析 40
第五章 結論 43
第六章 參考文獻 45

 
表目錄
表2.1滲氮種類的優缺點 11
表2.2氮化鐵薄膜文獻回顧彙整 15
表 4.1主流氣體為氮氫(N2/H2=9)，不同電漿距離的實驗參數表格 28
表 4.2主流氣體為氮氫(N2/H2=9)，不同電漿時間的實驗參數表格 30
表 4.3主流氣體為氮氫(N2/H2=9)，不同電漿瓦數的實驗參數表格 32
表 4.4未經電漿轟擊處理之表面成分分析 38
表 4.5在不同電漿轟擊距離及時間之表面成分分析 39
表4.6不同轟擊距離條件下之洛氏硬度值表格 41
表4.7不同轟擊時間條件下之洛氏硬度值表格 42

圖目錄
圖1.1噴射式電漿實驗裝置之示意圖[1] 6
圖1.2電暈放電實驗裝置之示意圖[2] 7
圖 1.3 電漿火炬實驗裝置之示意圖[3] 8
圖 1.4介電質放電實驗裝置之示意圖[4] 9
圖 3.1製備氮化鐵薄膜實驗流程圖 16
圖 3.2常壓電漿系統示意圖 18
圖 3.3常壓電漿系統之載台示意圖 19
圖 3.4本實驗使用之微波電源供應器實體照片 20
圖 3.5本實驗使用之氣體流量控制器實體照片 20
圖 3.6本實驗使用之共振腔與反應系統實體照片 21
圖4.1在主流氣體為氮氫(N2/H2=9)氣氛下，不同電漿距離轟擊10分鐘後之X光繞射結果 29
圖4.2在主流氣體為氮氫(N2/H2=9)氣氛下，固定轟擊距離18公分不同電漿時間之X光繞射結果 31
圖4.3在主流氣體為氮氫(N2/H2=9)氣氛下，固定轟擊距離18公分不同電漿瓦數之X光繞射結果 33
圖 4.4在常壓電漿下以不同轟擊距離條件下之表面形貌 35
圖 4.5在常壓電漿下以不同轟擊時間條件下之表面形貌 36
圖 4.6在不同轟擊距離條件下之洛氏硬度值 41
圖 4.7在不同轟擊時間條件下之洛氏硬度值 42

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