鎳鈦合金系統由於具備良好的耐腐蝕性、高生物相容性及優異的機械性能，並且擁有形狀記憶效應之特性，在各領域間都極具潛力。透過薄膜沉積技術，鎳鈦合金系統可以以多層膜的方式沉積於基板表面，形成鎳鈦金屬薄膜。
本研究以六種不同雙層週期膜厚之鎳鈦奈米多層膜，主要量測各雙層週期厚度條件之電流-電壓變化，以分析不同週期厚度對電性之影響。實驗以碳化矽(SiC)基板、矽(Si)基板及玻璃(Glass)基板作為沉積之基板，並將鎳/鈦分別以1:1、2:3之膜厚比例，週期性地沉積於基板上。由於鎳發生氧化時，會在表面形成緻密並帶有保護性質的氧化層，使鎳的氧化速率緩慢，所以在沉積完膜厚參數後，再沉積上一層2nm的鎳作為防氧化保護層。通過表面輪廓儀(Alpha step)量測，觀察沉積前後的表面粗糙度變化，並使用掃描式電子顯微鏡(SEM)觀察不同週期膜厚的鎳鈦奈米多層膜之表面形貌。通過能量散射光譜儀(EDS)分析鎳鈦奈米多層膜之元素分析，使用X射線繞射分析儀(XRD)對樣品進行結晶性之分析，使用微小維氏硬度試驗機得知各週期厚度的機械性質，並使用四點探針(Four point Probe)量測各樣品在提升電壓的情況下的電阻變化，從而分析各個週期厚度的鎳鈦奈米多層膜之電性差異。

The nickel-titanium alloy system has great potential in various fields due to its excellent corrosion resistance, high biocompatibility, and superior mechanical properties, as well as its characteristic shape memory effect. Through thin-film deposition techniques, the nickel-titanium alloy system can be coated on the surface of a substrate in a multilayer film structure, forming nickel-titanium metal films.
This study investigates the electrical properties of nickel-titanium nanolayered films with six different bilayer periodic thicknesses. The main focus is to measure the current-voltage variations under different bilayer thickness conditions to analyze their impact on electrical behavior. The experiments use silicon carbide (SiC), silicon (Si), and glass substrates for deposition, and nickel/titanium is deposited in a periodic manner with a 1:1 and 2:3 thickness ratio.To prevent oxidation of nickel, a protective oxide layer is formed on the surface when nickel is oxidized, leading to a slow oxidation rate. Therefore, after depositing the film thickness parameters, an additional 2nm layer of nickel is deposited as an anti-oxidation protective layer. The surface roughness changes before and after deposition are measured using a surface profiler (Alpha step), and the surface morphology of the different periodic thicknesses of nickel-titanium nanolayered films is observed using scanning electron microscopy (SEM).Elemental analysis of the nickel-titanium nanolayered films is performed using Energy Dispersive Spectroscopy (EDS), and their crystallinity is analyzed using X-ray Diffraction (XRD). The mechanical properties of each periodic thickness are determined using a micro Vickers hardness testing machine. The electrical resistance variation of each sample under increasing voltage is measured using a four-point probe, allowing for an analysis of the electrical differences among the different periodic thicknesses of nickel-titanium nanolayered films.

摘要......i
Abstract....ii
誌謝...iv
目錄....v
表目錄...viii
圖目錄....ix
第一章 緒論....1
1.1 前言....1
1.2 研究動機....2
第二章 理論基礎與文獻回顧...3
2.1 非線性電阻....3
2.2 物理氣相沉積......4
2.2.1 電子束蒸鍍原理.....5
2.2.2 電子束物理氣相沉積...7
2.2.3 平均自由路徑......9
2.3 四點探針......9
2.3.1 四點探針原理......10
2.4 蒸鍍靶材與基板材料之性質.......13
2.4.1 碳化矽基板....13
2.4.2 單晶矽基板....15
2.4.3 玻璃基板.....15
2.4.4 鎳......17
2.4.5 鈦.......18
第三章 實驗流程與儀器介紹...19
3.1 實驗材料...19
3.1.1 蒸鍍靶材...19
3.1.2 實驗基板....19
3.1.3 清洗用品....19
3.2 實驗流程.....19
3.3 實驗參數......21
3.3.1 膜厚參數.....21
3.4 實驗儀器.....23
3.4.1 電子束蒸鍍機(E-beam Evaporator)....23
3.5 分析儀器及原理....23
3.5.1 掃描式電子顯微鏡(Scanning Eleectron Microscope).....23
3.5.2 能量散射X射線光譜儀(Energy-Dispersive X-ray Spectroscopy,EDS).....24
3.5.3 表面輪廓量測儀(Alpha step)...25
3.5.4 四點探針量測儀(Four-Point Probe)......26
3.5.5 微小維氏硬度試驗機(Vickers Hardness Test)...27
3.5.6 光學數位顯微鏡(Optical microscope)....28
第四章 實驗結果與討論....29
4.1 鎳鈦多層膜之實際膜厚與表面形貌........29
4.1.1 實際薄膜厚度.....29
4.1.2 表面形貌觀察.....30
4.2 鎳鈦多層膜之成分分析.....39
4.2.1 元素組成成分分析.....39
4.3 鎳鈦多層膜之機械性質.....49
4.3.1 微小維氏硬度.....49
4.3.2 表面壓痕形貌.....51
4.4 鎳鈦多層膜之電性分析....61
4.4.1 I-V曲線....61
4.4.2 電阻率...67
第五章 結論.....73
參考文獻.......74

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