臺灣博碩士論文加值系統

在本研究中，首次嘗試在鈮酸鋰(LiNbO3)為基板上，沈積一金屬氧化物(氧化銦(In2O3)、氧化銦-氧化鋅(ZnO)、氧化鋅)做為光波導的材料，在不同時間、溫度、壓力與通氧之製程條件測試其波導之導光特性。
而在氧化銦熱擴散實驗中，主要是以EDS分析銦原子擴散入基板之原子百分比，以及利用SIMS測量銦原子縱深濃度分析。從實驗結果中，銦原子在時間、溫度與壓力之影響下，會決定其擴散深度與濃度，然而其結果並無法導光。因此，筆者在氧化銦條狀薄膜上多沈積一層氧化鋅(ZnO)薄膜，嘗試利用鋅原子藉由熱擴散將氧化銦擴散入鈮酸鋰基板，並且成功製作出氧化銦-氧化鋅波導。
而在氧化銦-氧化鋅波導的光場量測結果發現，由光折效應所引起的出射光場會有劇烈變動，從單模與多模之間來回變動，此在入射TE光時特別明顯，同時入射光強度愈大，出射光相對變動幅度也愈大，相對TM出射光則不甚明顯變動。此出射光的變動同樣也在氧化鋅波導上發現，但變動幅度則較輕微。

In this study, the guiding characteristics of metal-oxide (In2O3, In2O3/ZnO, and ZnO) indiffused waveguides depending on the diffusion time, temperature, and ambient have been experimentally studied in an x-cut lithium niobate for the first time.
In the experiments of an In2O3 thermal indiffusion process, the atomic percentages and depth profiles of the doped Indium atoms were analyzed by using EDS and SIMS techniques. The results show that the diffusion depths and doped concentrations are dependent on the process parameters of diffusion time, temperature, and pressure. It was found that the proposed In2O3 indiffusion process is not easy to make an optical waveguide on the substrate. Thus, an In2O3/ZnO co-diffusion method was proposed to make the successful channel waveguides.
Moreover, the measured near-field profiles indicate that the waveguide modes changed between a single and a multi mode under a highly irradiated power due to the photorefractive effects. In comparison with the input TM polarization, the guided modes are easy to oscillate temporally for the TE polarization, and the mode profiles changed obviously as well as an increase of input powers. Besides, the similar results were also observed in the ZnO indiffused waveguides. However, the power variations seem smaller than that of the In2O3/ZnO co-diffused ones.

中文摘要.........................................................................................................................i
英文摘要........................................................................................................................ii
誌謝...............................................................................................................................iii
目錄...............................................................................................................................iv
表目錄...........................................................................................................................vi
圖目錄..........................................................................................................................vii
第一章　緒論................................................................................................................1
1-1 研究背景.........................................................................................................1
1-2 研究動機.........................................................................................................2
第二章　鈮酸鋰特性簡介............................................................................................4
2-1 鈮酸鋰之基本特性.........................................................................................4
2-1-1 鈮酸鋰結構.............................................................................................4
2-1-2 鈮酸鋰之物理特性.................................................................................5
2-1-3 鈮酸鋰之電光特性.................................................................................5
2-1-4 鈮酸鋰之非線性光學特性.....................................................................6
2-1-5 鈮酸鋰之光折特性.................................................................................7
2-2 鈮酸鋰金屬摻雜與熱擴散.............................................................................8
2-2-1 長晶摻雜.................................................................................................8
2-2-2 擴散摻雜.................................................................................................8
2-3 光折參數量測.................................................................................................9
第三章　製程步驟與參數..........................................................................................11
3-1 製程步驟.......................................................................................................11
3-1-1 晶片清洗...............................................................................................11
3-1-2 光阻塗佈...............................................................................................12
3-1-3 曝光.......................................................................................................12
3-1-4 顯影.......................................................................................................12
3-1-5 薄膜蒸鍍與濺鍍...................................................................................12
3-1-6 掀離法...................................................................................................12
3-1-7高溫熱擴散.............................................................................................13
3-1-8 晶片研磨與拋光...................................................................................14
3-2 實驗設備－高溫爐管...................................................................................15
3-2-1 1200°C高溫箱形爐................................................................................15
3-2-2 高溫爐管...............................................................................................15
3-2-3 低壓爐管...............................................................................................15
3-3 波導特性量測...............................................................................................19
3-3-1 光場分佈量測系統...............................................................................19
3-3-2 極化相依損耗量測系統.......................................................................20
3-3-3 原子縱深濃度量測分析.......................................................................21
3-3-4 X-ray繞射分析......................................................................................21
第四章　實驗結果與討論..........................................................................................22
4-1 氧化銦鍍率與穿透率...................................................................................22
4-2 氧化銦熱擴散後之量測與探討...................................................................25
4-2-1 穿透率...................................................................................................25
4-2-2 斷面成份分析.......................................................................................27
4-2-3 熱擴散製程...........................................................................................28
4-2-4 低壓熱擴散製程……...........................................................................30
4-2-5 SIMS深度與濃度分析..........................................................................33
4-3 氧化銦與氧化鋅熱擴散實驗.......................................................................38
4-3-1 氧化銦-氧化鋅波導光場記錄..............................................................38
4-3-2 光場輸入輸出強度之探討…...............................................................40
4-3-3 熱擴散後之表面...................................................................................44
4-3-4 波導極化訊熄比...................................................................................45
4-4 XRD分析.......................................................................................................48
4-4-1 氧化銦熱擴散鈮酸鋰之XRD分析......................................................48
4-4-2 氧化銦-氧化鋅熱擴散鈮酸鋰之XRD分析........................................51
4-4-3 氧化鋅熱擴散鈮酸鋰之XRD分析......................................................53
4-4-4 金屬氧化物於鈮酸鋰之分析比較.......................................................56
第五章　結論..............................................................................................................59
5-1 氧化銦製程所得結論...................................................................................59
5-2 氧化銦-氧化鋅與氧化鋅波導製程所得結論….......................................59
5-3 XRD分析所得結論.......................................................................................60
5-4 未來展望.......................................................................................................61
參考文獻......................................................................................................................62
附錄A　波導熱擴散製程之參數...............................................................................67
A-1 氧化銦波導製程參數..................................................................................67
A-2 氧化鋅-氧化銦波導製程參數....................................................................68
A-3 氧化鋅波導製程參數..................................................................................68
附錄B　薄膜材料量測參數.......................................................................................69
B-1 氧化銦薄膜平面薄膜參數..........................................................................69
B-2 氧化銦-氧化鋅薄膜平面薄膜參數.............................................................69
B-3 氧化鋅結構與參數......................................................................................69




表　目　錄
表1-1 不同金屬摻雜對鈮酸鋰材料光折效應的影響................................................3
表1-2 不同銦金屬摻雜濃度對鈮酸鋰材料的光折效應改變....................................3
表2-1 鈮酸鋰之光雙折射率........................................................................................5
表4-1 氧化銦薄膜量測..............................................................................................23
表4-2 100nm氧化銦膜於各加熱擴散製程中之參數...............................................25
表4-3 SIMS量測試片參數.........................................................................................34
表4-4 氧化鋅-氧化銦波導製程參數.........................................................................38
表4-5 不同入射光角與出射光功率之記錄..............................................................46
表4-6 極化相依訊熄比..............................................................................................47
表4-7 氧化銦熱擴散鈮酸鋰參數..............................................................................49
表4-8 氧化銦-氧化鋅熱擴散鈮酸鋰參數.................................................................51
表4-9 氧化鋅熱擴散鈮酸鋰參數..............................................................................54
表4-10 金屬氧化物薄膜製程參數............................................................................56
表A-1 氧化銦試片與製程參數.................................................................................69
表A-2 氧化鋅-氧化銦波導製程參數........................................................................68
表A-3 氧化鋅試片與製程參數.................................................................................68
表B-1 氧化銦試片與製程參數.................................................................................69
表B-2 氧化鋅-氧化銦試片與製程參數....................................................................69
表B-3 氧化鋅試片與製程參數.................................................................................69






圖　目　錄

圖2-1 鈮酸鋰結構圖....................................................................................................4
圖2-2 鈮酸鋰晶體結構側面圖....................................................................................4
圖2-3 光折射效應電荷傳輸示意圖............................................................................7
圖2-4 馬赫任德干涉器量測光折射參數....................................................................9
圖2-5 費比佩洛干涉器(Fabry-Perot Interferometer)量測光折射參數系統............10
圖3-1 製程步驟流程圖..............................................................................................11
圖3-2 不同製程壓力之升溫、持溫時間示意圖.......................................................14
圖3-3 研磨片..............................................................................................................15
圖3-4 箱形爐與高溫爐管..........................................................................................17
圖3-5 低壓爐管示意圖..............................................................................................18
圖3-6 低壓爐管架構圖..............................................................................................18
圖3-7 光場分佈量測系統..........................................................................................19
圖3-8 極化方向調整示意圖......................................................................................19
圖3-9 極化相依損耗量測系統..................................................................................20
圖4-1氧化銦條狀波導膜厚圖....................................................................................24
圖4-2 氧化銦薄膜於鈮酸鋰之穿透率變化圖..........................................................24
圖4-3 熱擴散後晶片表面穿透率比較圖..................................................................26
圖4-4 不同製程參數SEM量測結果圖.....................................................................27
圖4-5 EDS量測結果圖...............................................................................................28
圖4-6 出射光結果圖(試片#XZ1S08)........................................................................29
圖4-7 出射光結果圖(試片#XY1D06).......................................................................29
圖4-8 光學顯微鏡拍攝之表面圖(波導耦合區部位)...............................................29
圖4-9 出射光結果圖(試片#XY1D04).......................................................................30
圖4-10 出射光結果圖(試片#XY1D08).....................................................................31
圖4-11 SEM所攝得的表面狀態圖(試片#XY3D01).................................................31
圖4-12 SEM所攝得的表面狀態圖(試片#XY1D08).................................................32
圖4-13 基板表面與氧化銦波導條狀薄膜截面圖(試片#XY1D08)….....................32
圖4-14 EDS所量測表面位置圖.................................................................................33
圖4-15 SIMS量測縱深濃度曲線圖(試片#INO1)….................................................34
圖4-16 SIMS量測縱深濃度曲線圖(試片#INO2).....................................................35
圖4-17 SIMS量測縱深濃度曲線圖(試片#INO3).....................................................35
圖4-18 SIMS量測縱深濃度曲線圖(試片#INO4).....................................................36
圖4-19 不同熱擴散條件之銦原子縱深濃度分佈比較圖........................................36
圖4-20 不同熱擴散條件之鋰離子縱深濃度分佈比較圖........................................37
圖4-21 膜層結構示意圖............................................................................................38
圖4-22 出射光場隨時間變化圖(試片$1).................................................................39
圖4-23 出射光場隨時間變化圖(試片$2).................................................................40
圖4-24 TE、TM光之輸入輸出光強度關係圖(試片$1).............................................41
圖4-25 TE、TM光之輸入輸出光強度關係圖(試片$2).............................................42
圖4-26 TE、TM光之輸入輸出光強度關係圖(試片$3).............................................42
圖4-27 TE、TM光之輸入輸出光強度關係圖(試片$4).............................................43
圖4-28 TE、TM光之輸入輸出光強度關係圖(試片$5).............................................43
圖4-29 熱擴散後的氧化銦-氧化鋅波導表面波導條狀殘餘圖...............................45
圖4-30 900°C 30分鐘、低壓1torr熱擴散後的氧化鋅波導表面條狀殘餘圖..........45
圖4-31 極化相依損耗量測比較圖............................................................................47
圖4-32 掃瞄角於20°至80°的XRD比較圖..............................................................49
圖4-33 掃瞄角於34°至36°的XRD比較圖..............................................................50
圖4-34 掃瞄角於72.8°至75.4°的XRD比較圖........................................................50
圖4-35 掃瞄角於20°至80°的XRD比較圖..............................................................52
圖4-36 掃瞄角於34.4°至35.6°的XRD比較圖........................................................52
圖4-37 掃瞄角於73°至74°的XRD比較圖..............................................................53
圖4-38 掃瞄角於20°至80°的XRD比較圖..............................................................54
圖4-39 掃瞄角於34°至36°的XRD比較圖..............................................................55
圖4-40 掃瞄角於73°至74.2°的XRD比較圖...........................................................55
圖4-41 金屬氧化物薄膜與基板於34.4°-35.6°之峰值比較.....................................57
圖4-42 金屬氧化物薄膜與基板於73°-74.2°之峰值比較........................................57
圖4-43 金屬氧化物熱擴散後與基板於34.4°-35.6°之峰值比較.............................58
圖4-44 金屬氧化物熱擴散後與基板於73°-74.2°之峰值比較................................58
圖A-1 膜層結構示意圖.............................................................................................67

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