本論文利用自製鋅礦散鈮酸鋰波導相位調制器，並且利用共路徑光學極化干涉方法結合LabVIEW人機介面軟體，以FFT方法來量測相位變化相關資訊，而利用此方法可以應用在量測在不同光折晶體的光致-雙折變化。

我們使用自製的鈮酸鋰鋅擴散波導相位調制器，與商用的電光調制器(EOM)作切換電壓與相位穩定性之比較。結果顯示，自製鋅波導相位調制器具有較低之切換電壓且更穩定之操作相位，接著我們利用此相位穩定操作之相位調制器，設計不同的量測方法與架構，來研究晶體光折相位與光雙折的變化，此外，我們也應用上述之架構，量測不同的晶體材料，例如: 鉭酸鋰(LiTaO3)與不同雜質掺入之鈮酸鋰(LiNbO3)，除了觀察入射光強度及時間對晶體光折相位之影響外，也探討不同傳播方向對光折效應之敏感度，希望能夠對於材料光折特性之研究，提供更便利之量測方法與平臺。

In this study, a homemade Zn-indiffused lithium niobate waveguide phase modulator, and a common-path optical polarimetric inteferometry performed on the LabVIEW-base platform were proposed to measure the optical phase variations by using the FFT analysis. The proposed instrument is successful in the measurement of light-induced birefringence changes for different photorefractive crystals.

First, a comparison of phase stability was experimentally studied between two different type phase modulators. The results show that the homemade wave-type modulator has a lower operation voltage and more stable phase stability compared with the commercial buck-type one. Then we use this stable Zn-indiffused phase modulator to provide the phase modulations in the optical homodyne measurement setup. The photorefractive effect and light-induced birefringence were discussed for some photorefractive crystals under different measurement arrangements. We believe that the proposed instrument could provide a flexible method and platform for studying the photorefractive effect in various photosensitive crystals.

摘要........................................................................................................................................iv
Abstract……...........................................................................................................................v
誌謝........................................................................................................................................vi
目次.......................................................................................................................................vii
表目錄....................................................................................................................................ix
圖目錄.....................................................................................................................................x
第一章 緒論.........................................................................................................................1
1.1 研究動機..................................................................................................................1
1.2 研究方法..........................................................................................................................2
1.2.1 相位光柵量測法...................................................................................................2
1.2.2 光雙折測量法.......................................................................................................4
1.2.3 波導元件量測方法...............................................................................................7
第二章 基本理論.................................................................................................................8
2.1 基本特性..................................................................................................................8
2.2 電光效應..................................................................................................................9
2.3 鐵電性....................................................................................................................11
2.4 光相位量測原理....................................................................................................12
2.5 LabVIEW 人機介面程式......................................................................................14
第三章 光相位量測架構...................................................................................................15
3.1 商用電光調制器....................................................................................................15
3.2 波導相位調制器....................................................................................................16
3.3 雙通道量測架構-晶體與晶片光折相位量測......................................................17
3.4 微位移雙通道量測架構........................................................................................18
3.5 同步異傳播方向晶體光折量測架構....................................................................19
3.6 雙波長量測架構....................................................................................................20
第四章 結果與討論...........................................................................................................21
4.1 EOM與波導相位調制器V之量測........................................................................21
4.2 EOM與波導相位調制器穩定度之量測................................................................22
4.3 晶體與晶片光折相位量測…................................................................................23
4.3.1 EOM光折相位量測.....................................................................................23
4.3.2 DC偏壓下EOM光折相位量測...................................................................26
4.4 微位移系統量測………………………………………………………................27
4.4.1 X-切/Y-傳播LN 量測結果…………….....................................................27
4.4.2 X-切/Z-傳播LN 量測結果……….............................................................39
4.4.3 Z-切/Y-傳播LT 量測結果………...............................................................31
4.5 三種不同摻雜之CLN晶體光折量測………..………………..………................33
4.5.1 同步異傳播方向晶體光折量測…………….............................................33
4.5.2 CLN晶體Z與X傳播方向之比較……….................................................34
4.5.3 以532nm入射光量測三種不同摻雜之CLN晶體………..........................36
4.6 雙波長光折量測………..……………………………………..………................39
第五章 結論.......................................................................................................................42
參考文獻……………...……. ……………………………………………………………..44
附錄A 光場圖……..………. ……………………………………………………………..47
附錄B 強度對照表………………………. …..…………………………………………..49

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