本論文成功開發，一具長時間即時監控之多通道光相位量測平臺，主要是結合電光調制波導元件、極化光學干涉原理、運用LabVIEW為主的訊號接收與處理介面，提供簡易及更具有系統整合之光電量測儀器。而以LabVIEW為主之訊號處理平台具有高度可擴充之特性，因此，可以發展雙極化，雙通道，三通道及四通道相位量測系統。而以積體化之電光調制晶片，配合光學干涉系統及結合LabVIEW軟體之強大功能，將有助於先期驗證波導元件特性，及在產品應用端之可行性，若再進一步整合其他微光學元件與封裝技術，將更能發展模組化之光電量測系統。

A multi-channel optical phase measurement instrument with capabilities of long-term and real-time monitoring has been successfully developed in this thesis. This instrument combines a waveguide phase modulator, a polarization interferometer, and a LabVIEW-based platform, which provides a simple and system integration for optical metrology. The multi-channel measurements including dual-polarization, dual-channel, three-channel, and four-channel set up have been successfully demonstrated by employing the flexible designs of LabVIEW programs. By combining the integrated electrooptic modulation chip, the powerful LabVIEW software, and the optical interferomertic system, it will be helpful to evaluate the performance of waveguide devices in the initial development period. Moreover it also can provide the evidence for the possibility of final product applications. We believe that the compact optical instrument is more achievable by integrating the micro-optic devices, the package technique, and the LabVIEW-based platform.

目 錄
摘要....................................................................................................................................i
Abstract…….....................................................................................................................ii
誌謝..................................................................................................................................iii
目錄.................................................................................................................................iv
表目錄...........................................................................................................................vii
圖目錄............................................................................................................................viii
第一章 緒論...................................................................................................................1
1.1 研究背景............................................................................................................1
1.2 研究動機......................................................................................................2
第二章 基本原理..........................................................................................................3
2.1 鈮酸鋰晶體特性......................................................................................................3
2.2 電光效應...........................................................................................................4
2.3 光相位量測系統簡介…………………………………………………………5
第三章 相位調制器製程............................................................................................9
3.1 晶片切割..........................................................................................................9
3.2 波導層製作..............................................................................................9
3.2.1 晶片清洗及烤乾...................................................................................10
3.2.2 光阻塗佈...................................................................................10
3.2.3 軟烤....................................................................................10
3.2.4 對準及曝光...................................................................................11
3.2.5 顯影...................................................................................11
3.2.6 鍍膜...................................................................................12
3.2.6-1 鈦製程...................................................................................12
3.2.6-2 鋅製程...................................................................................12
3.2.7 掀離...................................................................................12
3.2.8 膜厚量測...................................................................................13
3.2.9 熱擴散…....................................................................................13
3.2.10 研磨…................................................................................................13
3.2.11 導光情形量測....................................................................................14
3.3 電極層製作......................................................................................................15
3.3.1 對準及曝光....................................................................................15
3.3.2 顯影....................................................................................16
3.3.3 鍍膜....................................................................................16
3.3.4 掀離....................................................................................16
第四章 實驗量測架構.........................................................................................18
4.1 實驗架構簡介.............................................................................................18
4.2 雙通道量測系統..........................................................................................18
4.2.1 Mach-Zehnder雙極化相位量測系統................................................18
4.2.2 雙通道相位量測系統...........................................................................21
4.3 三通道量測系統.............................................................................................22
4.3.1光柵(Optical Grating)原理簡介................................................22
4.3.2 三通道相位量測系統...........................................................................23
4.4 四通道量測系統.............................................................................................24
第五章 結果與討論.....................................................................................................25
5.1 雙通道量測之結果..........................................................................................25
5.1.1 Mach-Zehnder 雙極化相位量測結果..................................................25
5.1.2 Mach-Zehnder 架構相位量測結果......................................................29
5.1.3 雙通道相位量測結果………………..................................................32
5.2 三通道量測之結果..........................................................................34
5.2.1 EO Modulator三通道相位量測結果....................................................34
5.2.2 三通道相位量測結果......................................................................36
5.1 四通道量測之結果.........................................................................................38
第六章 延伸應用.............................................................................................40
6.1 三通道相位量測系統應用簡介.....................................................................40
6.1.1 應用簡介…………………………………………..…………….40
6.1.2 電控微位移系統簡介………………………………..…………….40
6.1.3 稜鏡簡介……………………………………………..…………….41
6.2三通道相位量測系統應用架構..........................................................42
6.3三通道相位量測系統應用結果........................................................................42
第七章 結論.................................................................................................................45
參考資料.........................................................................................................................47
附錄A 波導相位調制器規格.....................................................................................51
A-1 直波導相位調制器規格……………….…………………………………51
A-2 Mach-Zehnder相位調制器規格…………….…………………………51
附錄 B元件實體圖.........................................................................................................53

參考資料
[1] M. Levesque and P. Tremblay, “A novel technique to measure the dynamic response of an optical phase modulator,” IEEE Trans. Instrum. Meas. ,vol. 44, pp. 952-957, 1995.
[2] J. Homola and S. S. Yee, “Novel polarization control scheme for spectral surface plasmon resonance sensors,” Sensors and Actuators B, vol.51, pp. 331-339, 1998.
[3] M. W. Wang, F. H. Tsai, and Y. F. Chao, “ In situ calibration technique for photoelastic modulator in ellipsometry,” Thin Solid Films, 355-356, pp. 78-83, 2004.
[4] R. R. Cordero and I. Lira, “Uncertainty analysis of displacements measured by phase-shifting Moire interferometry,” Optics communications, vol. 237, pp. 25-36, 2004
[5] H. K. Teng, C. Chou, and H. F. Chang, “Polarization-shifting interferometry on two –dimensional linear birefringent parameters measurement,” Optics communications, vol. 224, pp. 197-204, 2003.
[6] C. Pu, Z. Zhu, and Y. H. Lo, “A surface-micromachined optical self-homodyne polarimetric sensor for noninvasive glucose monitoring,” IEEE Photon. Technol. Lett. vol. 12, no. 2, pp. 190-192, 2000.
[7] R. C. Twu, H. Y. Hong, and H. H. Lee, “An optical homodyne technique to measure photorefractive-induced phase drifts in lithium niobate phase modulators,” Optics Express, Vol. 16, No. 6, pp. 4366-4374, 2008
[8] R.C. Miller and W.A. Nordland, "Absolute signs of second harmonic generation coefficients of piezoelectric crystals, " Phys. Rev. B, Vol.2, pp.4896–4902, 1970.
[9] G.L. Tangonan, M.K. Barnoski, J.F. Lotspeich and A. Lee, "High optical power capabilities of Ti-diffused LiTaO3 waveguide modulator structures," Appl. Phys. Lett. Vol.30, pp.238–239, 1977.
[10] http://www.crystaltechnology.com/docs/LNopt.pdf
[11] 光電概論 孫慶成 編著 全華出版
[12] Y. L. Lo, and P. F. Hsu, “Birefringence measurements by an electro-optic modulator using a new heterodyne scheme, “ Optical Engineering, Vol. 41, no. 11, pp. 2764-2767, 2002.
[13] C. Zhao, D. Kang, and J. H. Burge, “Effects of birefringence on Fizeau interferometry that uses polarization phase shifting technique, “ Applied Optics, Vol. 44, no. 35, pp. 7548-7553, 2005.
[14] Z. C. Jian, J. Y. Lin, P. J. Hsieh, and D. C. Su, “Measurements of material refractive index with a circular heterodyne interferometer, “ Proceedings of SPIE – The International Socirty for Optical Engineering, pp. 882-892, 2005.
[15] 徐斌峰，新型共路外差干涉量測系統之研發，碩士論文，國立成功大學機械工程學系，台南，2002。
[16] O. Eknoyan, H. F. Taylor, W. Matous, T. Ottinger, and R. R. Neugaonkar, “Comparison of photorefractive damage effect in LiNbO3, LiTaO3, and Ba1-xSrxTiyNb2-yO6 optical waveguides at 488nm wavelength, ” Appl. Phys. Lett., Vol.71, no. 21, pp. 3051-3053, 1997.
[17] T. Fujiwara, R. Srivastava, X. Cao, and R. V. Ramaswamy, “Comparison of photorefractive index change in proton-exchanged and Ti-diffused LiNbO3 waveguides,“ Opt. Lett., Vol. 18, no. 5, pp. 346-348, 1993.
[18] P. Hua, B. J. Luff, G. R. Quigley, J. S. Wilkinson, K. Kawaguchi, “Integrated optical dual Mach-Zehnder interferometer sensor, ” Sens. Actuators B, Vol. 96, pp. 554-559, 2003.
[19] S. D. Nicola, P. Ferraro, A. Finizio, P. D. Natale, S. Grilli, G. pierattini, “A Mach-Zehnder interferometric system for measuring the refractive indices of uniaxial crystals, “ Optics Communications, Vol. 202, pp. 9-15, 2002.
[20] W. J. Bates, “A wavefront shearing interferometer,” Proc. Phys. Soc., Vol. 59, pp. 940, 1947.
[21] S. J. Friedman, B. Barwick, and H. Batelaan,” Focused-Laser interferometric position sensor,” Rev. Sci. Instrum., Vol. 76, PP. 123106, 2005.
[22] J. Y. Lee, H. Y. Chen, C. C. Hsu, and C. C. Wu, “Optical heterodyne grating interferometry for displacement measurement with subnanometric resolution, ” Sensors and Actuators, A 137, pp. 185-191. 2007.
[23] S. H. Lu, S. P. Pan, T. S. Liu, and C. F. Kao, “Liquid refractometer based on immersion diffractometry, ” Optics Express, Vol. 15, No. 15, pp. 9470-9475, 2007.
[24] T. J. Wang and C. W. Hsieh, “Surface plasmon resonance biosensor based on electro-optically modulated phase detection,” Optics Letters, Vol. 32, No. 19, pp.2834-2836, 2007.
[25] T. Matsushita, T. Nishikawa, H. Yamashita,J. Kishimoto, Y. Okuno; “Development of new single-mode waveguide surface plasmon resonance sensor using a polymer imprint process for high-throughput fabrication and improved design flexibility, ” Sensors and Actuators, B 129, pp. 881-887, 2007.
[26] S. Y. Wu, H. P. Ho, W. C. Law, Chinlon Lin, and S. K. Kong, “Highly sensitive differential phase-sensitive surface plasmon resonance biosensor based on the Mach-Zehnder configuration,” Optics Letters, Vol.29, No. 20, pp. 2378-2380, 2004.