1.M. Horie, “Plasma-structure dependence of the growth mechanism of plasma-polymerized fluorocarbon films with residual radicals”, J. Vac. Sci. Technol A., 13, 2490 (1995).
2.D. Liu, Y. Yin, D. Li, J. Niu, Z. Feng, “Surface modification of materials by dielectric barrier discharge deposition of fluorocarbon films”, Thin Solid Films, 517, 3656 (2009).
3.Y. Ma, H. Yang, J. Guo, C. Sathe, A. Agui, J.Nordgren,“Structural and electronic properties of low dielectric constant fluorinated amorphous carbon films”, Appl. Phys. Lett., 72, 3353 (1998).
4.S. Takeishi, H. Kudo, R. Shinohara, S. Fukuyama, J. Yamaguchi, M. Yamada, “Plasma-enhanced chemical vapor deposition of fluorocarbon films with high thermal resistance and low dielectric constants”, J. Electrochem. Soc., 144, 1797 (1997).
5.P. Favia, G. Cicala, A. Milella, F. Palumbo, P. Rossini, R. d’Agostino, “Deposition of super-hydrophobic fluorocarbon coating in modulated RF glow discharge”, Surf. Coat. Technol., 169-170, 609 (2003).
6.F. Intranuovo, E. Sardella, P. Rossini, R. d’Agostino, P. Favia, “PECVD of Fluorocarbon Coatings from Hexafluoropropylene Oxide: Glow vs. Afterglow”, Chem. Vap. Deposition, 15, 95 ( 2009).
7.C. B. Labelle, R. Opila, A. Kornblit, “Plasma deposition of fluorocarbon thin films from c-C4F8 using pulsed and continuousrf eccitation”, J. Vac. Sci. Technol. A, 23, 190 (2005).
8.K. Takahashi, A. Itoh, T. Nakamura, K. Tachibana,“Radical kinetics for polymer film deposition in fluorocarbon (C4F8 , C3F6 and C5F8) plasmas ”, Thin Solid Films , 374, 303 (2000)
9.潘建瑄,以低壓二氟甲烷電漿製備疏水薄膜及其應用,元智大學化學工程與材料科學學系碩士論文 (2010)。10.洪昭南、郭有斌,以化學氣相沉積法成長半導體薄膜,化工技術,81,190 (1999) 。11.田民波、顏怡文,薄膜技術與薄膜材料,五南圖書出版股份有限公司 (2007) 。
12.E. Sardella, F. Intranuovo, P. Rossini, M. Nardulli, R. Gristina, R. d’Agostino,and P. Favia,“Plasma Enhanced Chemical Vapour Deposition of Nanostructured Fluorocarbon Surfaces”, Plasma Process. Polym., 6, 57 (2009).
13.H. Yasuda, Plasma Polymerization, Academic Press, (1985).
14.楊士賢,以脈衝式電漿輔助化學氣相沉積法製備氟化非晶碳膜之研究,中原大學化學工程學系碩士論文(2005) 。15.劉志宏,應用實驗技術法與電漿診斷技術探討電漿沉積氟碳膜製程之研究,中原大學化學工程學系博士論文(2005) 。16.W. Barthlott, C. Neinhuis, “Purity of the sacred lotus, or escape from contamination in biological surfaces”, Planta, 202, 1 (1997).
17.F. Hochart, J. Levalois-Mitjaville, R. D. Jaeger,L. Gengembre, J. Grimblot, “Plasma surface treatment of poly(acrylonitrile) films by fluorocarbon compounds ”, Appl. Surf. Sci. ,142, 574 (1999).
18.欣創達科技有限公司
19.吳平耀,表面張力、被覆與塗佈,塑料技術—技術文壇(2001)
20.Sindatek, 光學影像接觸角量測儀影像分析原理的界面化學分析系統
21.何明勳、吳智遠、陳妙娟、馮海東,以動態表面張力及接觸角變化評估展著劑之功效,植物保護學會會刊, 47,59( 2005)22.王怡婷,超疏水表面之製備及其學理研究,國立交通大學應用化學研究所碩士論文 (2006)。23.A. Satyaprasad, V. Jain, S. K. Nema,“Deposition of superhydrophobic nanostructured Teflon-like coating using expanding plasma arc”, Appl. Surf. Sci. , 253 , 5462 (2007)
24.吳方伶,奈米結構塗層表面之超疏水/疏油行為探討,元智大學化學工程與材料科學學系碩士論文 (2008)。25.D. Quere, “Rough ideal on wetting”, Journal of physica A, 313, 32 (2002).
26.林昭榮,特殊的界面活性劑與異常的潤濕現象,國立中央大學化學工程與材料工程學系碩士論文 (2008)。27.http://www.cc.ntut.edu.tw/~jsechang/jsechang5/information/Expt_2_13.pdf
28.R. N Wenzrl, “Resistance of Solid Surface to Wetting by water”, Ind. Eng. Chem., 40, 988 (1936)
29.A. B. D. Cassie, S. Baxter, “Wettability of Porous Surface”, Transactions of the Faraday Society, 40, 546 (1944).
30.范麗霞、王錫彬、楊先會,細菌纖維素生物理化特性及其應用, 海南醫學院學報,10,4 (2004)。
31.K. Endo, T. Tatsumi, “Fluorinated amorphous carbon thin films grown by plasma enhanced chemical vapor deposition for low dielectric constant interlayer dielectrics”, J. Appl. Phys., 78, 1370 (1995) .
32.A. Milella, F. Palumbo, P. Favia, G. Cicala, R. d’Agostino, “Continuous and Modulated Deposition of Fluorocarbon Films from c-C4F8 Plasmas”, Plasma Process Polym., 1, 164 (2004).
33.P. Favia, G. Cicala, A. Milella, F. Palumbo, P. Rossini, R. d’Agostino, “Deposition of super-hydrophobic fluorocarbon coating in modulated RF glow discharge”, Surf. Coat. Technol., 169, 609 (2003).
34.M. A. Gilliam, Q. Yu, H. Yasuda, “Plasma Polymerization Behavior of Fluorocarbon Monomers in Low-Pressure AF and RF Discharges”, Plasma Process Polym., 4, 165 (2007).
35.C. I. Butoi, N. M. Mackie, L. J. Gamble, D. G. Castner, J. Barnd, A. M. Miller, E. R. Fisher, “Deposition of highly ordered CF2-rich films using continuous wave and pulsed hexafluoropropylene oxide plasmas”, Chem. Mater., 12, 2014 (2000).
36.S. J. Limb, K. K. Gleason, D. J. Edell, E. F. Gleason, “Flexible fluorocarbon wire coatings by pulsed plasma enhance chemical vapor deposition”, J. Vac. Sci. Technol. A, 15, 1814 (1997).
37.D. Liu, Y. Yin, D. Li, J. Niu, Z. Feng, “Surface modification of materials by dielectric barrier discharge deposition of fluorocarbon films”, Thin Solid Films, 517, 3656 (2009).
38.L. Laguardia, D. Ricci, E. Vassallo, A. Cremona, E. Mesto, F. Grezzi, F. Delleram, “Deposition of super-hydrophobic and oleophobic fluorocarbon films in radio frequency flow discharge”, Macromol. Symp., 247, 295 (2007).
39.E. J. Winder, K. K. Gleason, “Growth and characterization of fluorocarbon thin films grown from trifluoromethane (CHF3) using pulsed-plasma enhanced CVD”, J. Appl. Poly. Sci., 78, 842 (2000).
40.Y. Iriyama, M. Noda, “Plasma polymerization of fluoromethanes”, J. Poly. Sci., 36, 2043 (1998).
41.Y. Ohtsu, N. Yamagami, H. Fujita, “Ultra-Water Repellency of Films Prepared by Capacitively Coupled C2H2F2/Ar Discharge plasma”, Jpn. J. Appl. Phys., 46, 679 (2007).
42.I. Woodward, W. C. E. Schofield, V. Roucoules, J. P. S. Badyal, “Super-hydrophobic Surfaces Produced by Plasma Fluorination of Polybutadiene Films”, Langmuir, 19, 3432 (2003).
43.Michael D. Garrisona, b, Reto LuginbuÈhla, Rene M. Overneyc, Buddy D. Ratner, “Glow discharge plasma deposited hexafluoropropylene films: surface chemistry and interfacial materials properties”, Thin Solid Films, 352, 13 (1999).
44.T. Shirafuji, Y Nishimura, K. Tachibana, “Plasma polymerization of fluorocarbon thin films on high temperature substrate and its application to low-k films”, Thin Solid Films, 515, 4111 (2007).