CrN擁有出色的耐磨性、高硬度、熱穩定性、良好的電導率及抗氧化性質，廣泛使用於切削工具、保護和耐磨塗層。添加Al可有效改善其抗氧化性，提升其高溫穩定性，相關性質及應用有大量的研究文獻被提出，大部分的研究侷限於機械相關性質，在光學性質與電性方面的研究較為稀少。本實驗利用反應式磁控濺鍍製程製備CrN及不同Al含量之Cr1-XAlXN單層薄膜，探討添加Al對Cr1-XAlXN微結構、光學性質及電性的影響。
使用UV/VIS/NIR量測穿透率及反射率，並利用穿透率及反射率計算出其吸收率以及透過能隙公式計算其光學能隙。使用橢圓偏光儀量測CrN及CrAlN 薄膜的折射率及消光係數。使用場發射掃描電子顯微鏡(FE-SEM)、能量散射光譜儀(EDS)、及低掠角X光繞射儀來觀察薄膜表面、組織結構、化學組成。霍爾量測及四點探針量測電性。
結果指出Cr1-XAlXN薄膜隨著鋁含量的增加，穿透率、能隙值及電阻值均增加，表面形貌由尖錐狀逐漸轉變成平滑狀。Cr1-XAlXN在真空與大氣環境下經300~600 ℃持溫2小時，形貌與結構無明顯變化，相較於CrN有優異抗氧化性。

CrN have excellent wear resistance, high hardness, thermal stability, good conductivity and oxidation resistance, and is used widely in cutting tools, protective and wear-resistant coating. The addition of Al in CrN can effectively improve the antioxidant property and high-temperature stability of CrN. Most of the reports related to Cr1-XAlXN are confined to mechanical properties and only a few reports related to the optical and electrical properties of CrAlN have been found. In this study, Cr1-XAlXN thin films with different Al contents were prepared by reactive magnetron sputtering. Effects of the Al content on the optical and electrical properties of Cr1-XAlXN were investigated.
The transmittance and reflectance of Cr1-XAlXN were measured by using the UV/VIS/NIR. The optical energy gap was calculated from the absorptance by using the energy gap equation. The refractive indexes and extinction coefficient of CrN and Cr1-XAlXN films were obtained by using an ellipsometer. The chemical composition and structure of the studied films were characterized by using the FE-SEM, EDS and GIXRD .The Hall Effect Analyzer and Four-point probe were used to measure the electrical properties of Cr1-XAlXN films.
The transmittance increased.The energy gap increased, and the surface morphology changed from the pyramid-like into smooth state when the Al content of Cr1-XAlXN was increased. Increasing the Al content increased the dielectric property of Cr1-XAlXN. Cr1-XAlXN was held at 300-600 °C for 2 hours under vacuum and atmospheric conditions, and its morphology and structure did not change significantly. Compared with CrN, it had excellent oxidation resistance.

摘要......i
Abstract......ii
誌謝......iv
目錄......v
表目錄......vii
圖目錄......ix
第一章、緒論......1
1.1 前言......1
1.2 研究動機......1
第二章、文獻探討......2
2.1 鍍層材料......2
2.1.1氮化鉻(CrN)......2
2.1.2氮化鋁鉻(CrAlN)......2
2.2 能隙計算......2
2.3 濺鍍方法......3
2.3.1 電漿原理......3
2.3.2 物理氣相沉積 (Physical Vapor Deposition)......4
2.3.3 濺鍍系統......4
第三章、實驗步驟及儀器介紹......9
3.1 實驗材料......9
3.1.1 靶材......9
3.1.2 化學藥品......9
3.1.3 氣體......9
3.1.4 基板......9
3.2 製程設備與分析儀器......10
3.2.1 反應式磁控濺鍍系統 (Reactive Magnetron Sputter System)製備單層薄膜......10
3.2.2 紫外光/可見光/近紅外光光譜儀 (UV/Vis/NIR Spectrophotometer)......10
3.2.3 X光繞射分析儀......10
3.2.4 場發射掃描式電子顯微鏡 (Field Emission Gun Scanning Electron Microscopy)......11
3.2.5 能量散射光譜儀(Energy Dispersive Spectroscope)......11
3.2.6 霍爾量測儀 (Hall Effect Analyzer)......11
3.2.7 四點探針 (4-terminal measurement )......12
3.2.8 橢圓測厚儀 (Eillipsometer)......12
3.3 實驗製程......13
3.3.1 基材前處理......13
3.3.2 CrN與Cr1-XAlXN單層鍍膜之製備......13
3.3.3 薄膜結構分析......13
3.3.4 光學性質分析......14
3.3.5 電性質分析......14
3.3.6 熱穩定測試......14
3.4 實驗流程......15
第四章、結果與討論......19
4.1 Cr1-XAlXN鍍膜之製備及性質探討......19
4.1.1 Al含量對Cr1-XAlXN之成分、形貌及微結構影響......19
4.1.2 Al含量對於Cr1-XAlXN之光學性質影響......20
4.1.3 Al含量對於Cr1-XAlXN之電性影響......21
4.2 Cr1-XAlXN鍍膜之熱穩定性能探討......28
4.2.1 CrN及Cr1-XAlXN鍍膜經真空熱穩定測試後之形貌、結構、光學性質、電性變化......28
4.2.2 CrN及Cr1-XAlXN鍍膜經大氣熱穩定測試後之成分、形貌、結構、光學性質、電性變化......43
第五章、結論......62
參考文獻......63
Extended Abstract......68

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