臺灣博碩士論文加值系統

本實驗是探討低溫快速退火對Ni/Co/Ti多層膜之影響，研究不同三層鍍膜週期數對多層膜快速退火前後相變化及物理性質之影響，本實驗使用碳化矽(SiC)作為基板蒸鍍Ni/Co/Ti多層膜，由於材料與基板晶格常數越接近時在接合處會產生更強的接合力，而選用晶格參數較為接近SiC的Ni作為接觸層，SiC經過鑽石拋光盤研磨及添加雙氧水(H2O2)進行拋光得以清除SiC基板表面上的二氧化矽(SiO2)，可以提供更為平整的表面進而提高鍍膜品質，以真空電子束蒸鍍機鍍膜，在總厚度不變，Ni/Co/Ti以不同周期數進行鍍膜，比例採用1:1:2，當Ni為1 nm、Co為1nm、Ti為2 nm，最後都再鍍上10nm的Ni作為保護層，本研究以二種不同周期數的Ni/Co/Ti多層膜，在三種不同退火溫度(350℃、450℃、550℃)下進行快速退火10分鐘後，使Ni層、Co層和Ti層相互反應產生結構及物理性質改變。
運用掃描式電子顯微鏡(SEM)及原子力顯微鏡(AFM)和三維表面輪廓分析儀觀察退火前後的奈米多層膜層與層之間的形貌變化，以X-射線繞射分析(XRD)分析各層之間的結晶性，使用奈米壓痕及微小維氏硬度機觀察快速退火前後多層膜的物理性質，利用四點探針觀察退火對多層膜之電性之影響，運用雙束型聚焦離子束顯微系統(FIB)進行試片破斷，用穿透式電子顯微鏡(TEM)觀察試片橫截面。

This experiment is to investigate the effect of low temperature rapid annealing on Ni/Co/Ti multilayer films. Study on the effect of different three-layer coating cycle number on phase change and physical properties before and after rapid annealing of multilayer films. This experiment uses silicon carbide (SiC) as a substrate to evaporate Ni/Co/Ti multilayer film. Since the closer the material and the substrate lattice constant are, the stronger bonding force is generated at the joint, and the Ni with the lattice parameter closer to SiC is selected as the contact layer. SiC is polished by diamond polishing disc and added with hydrogen peroxide (H2O2) to remove cerium oxide (SiO2) on the surface of SiC substrate, which can provide a flat surface and improve coating quality. The film was coated by a vacuum electron beam evaporation machine, and the total thickness was constant, and Ni/Co/Ti was coated at different cycle numbers. The ratio is 1:1:2. When Ni is 1 nm, Co is 1 nm, Ti is 2 nm, and finally 10 nm of Ni is plated as a protective layer. In this study, the Ni, Co/Ti multilayer films of two different cycles were rapidly annealed at three different annealing temperatures (350℃, 450℃, 550℃) for 10 minutes, then the Ni layer, the Co layer and the Ti layer were mutually the reaction produces structural and physical properties that change. Scanning electron microscopy (SEM), atomic force microscopy (AFM) and 3D-surface profiler were used to observe the morphology changes between the nano-layers and layers before and after annealing. The crystallinity between the layers was analyzed by X-ray diffraction analysis (XRD), and the physical properties of the multilayer film before and after the rapid annealing were observed using a nanoindentation and a micro Vickers hardness machine. The effect of annealing on the electrical properties of the multilayer film was observed using a four-point probe. Application type dual-beam focused ion beam microscope (FIB) for breaking the test piece. The cross section of the test piece was observed by a transmission electron microscope (TEM).

摘要.........i
Abstract.........iii
誌謝.........v
目錄.........vi
表目錄.........x
圖目錄.........xi
第一章 緒論.........1
1.1前言.........1
1.2研究動機與目的.........2
第二章 理論基礎及文獻回顧.........3
2.1物理氣相沉積.........3
2.1.1沉積原理.........3
2.1.2電子束蒸鍍簡介.........6
2.1.3電子束蒸鍍原理.........6
2.1.4平均自由徑.........8
2.2蒸鍍靶材與基板材料及其性質.........10
2.2.1碳化矽基板.........10
2.2.2鎳靶.........11
2.2.3鈷靶.........11
2.2.4鈦靶.........11
2.3快速退火快速升溫之熱輻射原理.........12
2.4奈米壓痕.........12
2.4.1奈米壓痕原理.........13
2.4.2楊氏係數(Young’s Modulus).........14
2.5四點探針.........15
2.5.1四點探針原理.........15
第三章 實驗方法與步驟.........17
3.1實驗流程.........17
3.2實驗參數.........19
3.2.1膜厚參數.........19
3.2.2退火參數.........20
3.3實驗材料.........20
3.4實驗設備.........21
3.4.1實驗設備.........21
3.5分析儀器原理簡介.........24
3.5.1 三維表面輪廓分析儀(3D-surface profiler).........24
3.5.2 原子力顯微鏡（Atomic Force Microscope）.........25
3.5.3 掃描式電子顯微鏡(Scanning Electron Microscope).........26
3.5.4 能量散佈光譜儀(Energy-Dispersive X-ray Spectroscopy).........27
3.5.5 X光繞射儀(X-ray Diffrzction).........28
3.5.6微小維氏硬度機(Vickers Hardness Test).........29
3.5.7奈米壓痕試驗機(Nano-Indentation System).........30
3.5.8四點探針量測儀(Four point probe).........31
第四章 結果與討論.........32
4.1碳化矽基板與鎳鈷鈦多層膜退火前後表面形貌與粗糙度分析.........32
4.1.1碳化矽基板與鎳鈷鈦多層膜退火前後表面輪廓儀分析.........32
4.1.2 AFM分析碳化矽基板表面粗糙度.........42
4.1.3 SEM觀察碳化矽基板與鎳鈷鈦多層膜退火前後表面形貌.........43
4.2鎳鈷鈦多層膜退火前後成分分析.........48
4.2.1 EDS分析鎳鈷鈦多層膜退火前後的成分.........48
4.2.2 EDS單點分析鎳鈷鈦多層膜退火後之成分.........53
4.2.3 XRD分析鎳鈷鈦多層膜與碳化矽基板之間結構成分.........58
4.3鎳鈷鈦多層膜退火前後的機械性質.........59
4.3.1鎳鈷鈦多層膜退火前後之微小硬度.........59
4.3.2 SEM觀察鎳鈷鈦多層膜退火前後之表面壓痕.........60
4.3.3奈米壓痕機分析鎳鈷鈦多層膜退火前後的機械性質.........65
4.4鎳鈷鈦多層膜退火前後之電性.........68
4.4.1不同三層週期數之鎳鈷鈦多層膜退火前後四點探針分析.........68
4.4.2不同三層週期數之鎳鈷鈦多層膜退火前後之IV曲線.........69
4.4.3鎳鈷鈦多層膜進行急冷後室溫下四點探針分析.........71
4.4.3鎳鈷鈦多層膜進行急冷後之I-V曲線.........72
4.5 鎳鈷鈦多層膜之橫截面.........74
4.5.1 EDS分析鎳鈷鈦多層膜之橫截面.........74
4.5.2 TEM分析鎳鈷鈦多層膜之橫截面.........74
4.6鎳鈷鈦多層膜退火前後表面光學分析.........77
4.6.1鎳鈷鈦多層膜退火前後表面光學影像.........77
第五章 結論.........79
參考文獻.........80
Extended Abstract.........83

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