臺灣博碩士論文加值系統

隨著LCD產業日益發展，微影製程技術亦相對漸形重要。如何在一次又一次的重複曝光中，使其疊對誤差能夠控制在許可的範圍內，其正確的補償參數將是不可或缺的因素之一。本論文中將針對此部分之疊對誤差精度進行探討。以既有之微影製程為架構，針對可能產生之疊對誤差原因、種類進行分析，再以最小平方法之理論基礎，建立相關模型，期望能藉此找出一實用且精確之參數估計方式，以幫助工程師在現場作出即時、正確的判斷，而達到改善製程品質、提升設備總體效能之目的。研究內容主要是透過各種估測模型來進行比較，進而產生較為精準的微影覆蓋誤差模型，將此參數做為曝光機台補正之依據，以達到疊對誤差之補償。

As LCD industry being growing, Lithography technology is relatively important. How among Lithography Process again and again, make Overlay can be controlled in the range permitting, the correct compensation parameter will be one of the indispensable factors . Will probe into Overlay Accuracy of this part this thesis. Regard Lithography Process that has already the structure had as, analysis to Overlay Error reason , kind that may produced , and then with the theoretical foundation of the least squares method , set up relevant model , expect to be able to find out the practical and accurate parameter and estimate the way by this, in order to help the engineer to make the instant , correct judgment live , and achieve and improve the quality of the products , purpose to raise overall efficiency of the equipment. The research contents are mainly to estimate the model of examining to compare through various kinds of, and then produce comparatively perfect Lithography Overlay model, do for Lithography Process the basis that is added and corrected of this parameter, achieve the purpose that overlay error compensates.

書名頁 ………………………………………………………………… i
論文口試委員審定書 ………………………………………………… ii
授權書 ……………………………………………………………… iii
中文摘要 ……………………………………………………………… iv
英文摘要 ……………………………………………………………… v
誌謝 …………………………………………………………………… vi
目錄 …………………………………………………………………… vii
表目錄 ………………………………………………………………… viii
圖目錄 ………………………………………………………………… ix
一、 緒論 …………………………………………………… 1
1.1 研究動機與目的 ……………………………………… 1
1.2 文獻回顧 ……………………………………………… 1
1.3 研究方法 ……………………………………………… 2
1.4 論文架構 ……………………………………………… 3
二、 微影製程與步進式曝光機之疊對方式簡介 ………… 5
2.1 微影製程簡介 ………………………………………… 6
2.2. 步進式曝光機之疊對介紹 …………………………… 9
三、 疊對誤差模式說明與研究方法 ……………………… 12
3.1 微影製程疊對誤差原因 ……………………………… 12
3.2 疊對誤差之種類與說明 ……………………………… 14
3.3 微影製程疊對數學模型 ……………………………… 17
3.4 最小平方法估測 ……………………………………… 19
四、 實驗結果與分析 ……………………………………… 23
4.1 實驗模型 ……………………………………………… 23
4.2 參數估測流程與數值分析 …………………………… 26
4.2.1 數值模擬 ……………………………………………… 27
4.3 實驗結果分析 ………………………………………… 34
五、 結論 …………………………………………………… 39
參考文獻 …………………………………………………………… 41
自傳 …………………………………………………………… 42

參 考 文 獻
1. Perioff,D.s.,”A Four-Point Electrical Measurement Technique for characterizing Mask superposition Errors on semiconductor Wafer,”IEEE Joyrnal of Solid-state circuits, Vol.Sc-13, NO.4, pp.436-444,Augst, 1978.
2. MacMillen,D.and W.D.Ryden, “Analysis of image field placement deviation of a 5*microlithography reduction lens”, Proceedings SPIE: Optical Micro-Lithography-Technology, Vol.334,PP.78-89, 1982
3. C.K.Peski, ”Minimizing Patter Registration Error Through Wafer Stepper Matching Techniques”, Solid State Technology, Vol.334, PP.78-89, 1982
4. W.H. Arnold.”Image Placement differences between 1:1 Projection aligners and 10:1 reduction Wafer Steppers”, Proceeding of SPIE: Opt.Microlith. Vol.394.PP.87-98 1983
5. Fink, I., Neal Sullivan and James, S.Leaks,” Overlay Sample Plan Optimization for the Detection of Higher Order Contributions to Misalignment,” SPIE Vol.2196, Integrated circuit Metrology, Inspection, and process Control, VIII, pp.389-399,1994
6. Warren W.Flack, Gary E.Flores, Alan Walther and Manny Ferreira “ A Reticle Correction Technique to Minimize Lens Distortion Effect,” BACUS Symposium, 1994.
7. Zone-ching LIN and Wen-Jang WU, “Multiple Linear Regression Analysis of Overlay Accuracy Model, “ IEE,Vol.12,NO.2,May 1999.
8. Zone-ching LIN and Wen-Jang WU, “Analysis on Overlay Accuracy Error Parameters,” Proc.Natl.Sci.Counc.ROC Vol.22 No.2,PP.236-271, 1998.
9. Warren W.Flack, Susan Avlakeotes, David chen, and Gary E. Flores ”Efficient Overlay Optimization of Stepper Correctables “, SPIE 1996.
10. Gary E. Flores, Warren W.Flack, Susan Avlakeotes and Bob Martin “Process Control of Stepper Overlay Using Multivariate Techniques”, OCG 1995.
11. Chien-Sheng Yang “Shot Mura Effects in Large Area TFT-LCD Caused By Steppers”, SEMI FPD Expo Taiwan 2000.
12. Warren W.Flack, Gary E. Flores, Joseph C. Pellegrini and Mark Merrill “An Optimized Registration Model for 2:1 Stepper Field Matching”, Optical/Laser Microlityography VII Proceedings, SPIE 2197（1994）.
13. 施澄鍾, “數值分析”,P.342-P.344 松崗電腦圖書資料股份有限公司,1993.
14. 紀國鍾,鄭晃忠,”液晶顯示器技術手冊”, 經濟部技術處 發行.
15. 施錫龍 “微製程概論(IC 及TFT/LCD)”,國家奈米元件實驗室
16. 莊達仁, “VLSI製造技術”, 高利圖書有限公司, 2002
17. Hong Xiao原著, 羅正忠譯, “半導體製程技術導論”,學銘圖書有限公司, 1991.
18. 王士維, “黃光區對準製程監測之資訊系統設計” P.8-P.11,國立台灣大學工業工程學研究所碩士論文, 1997.
19. Hiroyuki Ito, “Mirror Projector System for the 5th and 6th Generation”, IDMC, Proceedings, 2003.