臺灣博碩士論文加值系統

在我的研究中應用了氧化鋅/電極/二氧化矽/矽和電極/氧化鋅/二氧化矽/矽的結構元件，氧化鋅薄膜的濺鍍環境為60%氬氣與40%的氧氣，濺鍍壓力為20m torr，濺鍍功率為150W，氧化鋅膜厚分別為3μm和5μm，氧化鋅薄膜利用場發射掃描式電子顯微鏡(FE-SEM)分析薄膜結晶構造及表面形貌分析，X光繞射分析儀(XRD)來觀察氧化鋅的晶體取向，螢光光譜分析儀(PL)去看氧化鋅的發光特性檢測，能量散佈光譜儀(EDS)來進行元素分析。
首先研究了氧化鋅厚度和元件結構對光催化降解甲醛的影響，再使用LCR 阻抗分析儀量測不同氧化鋅薄膜厚度以及不同結構的元件照射不同波長紫外光之電容值與電阻值的變化量，最後再使用綠光以及紅光的雷射和LED燈去對元件進行照射，去觀察元件的電容值與電阻值的變化。

ZnO/electrode/SiO2/Si and electrode/ZnO/SiO2/Si structures of devices were applied in my research. The sputtering environment to zinc oxide film is 60% argon and 40% nitrogen, pressure is 20m torr, power is 150W, zinc oxide film thickness is 3um and 5um. Analysis of Crystal Structure and Surface Morphology of zinc oxide Thin Films by FE-SEM Analysis. XRD to observe the crystal orientation of zinc oxide, PL to see the luminescence of zinc oxide detection, EDS for photometric analysis.
First, Effects of ZnO thickness and device structure on photocatalytic degradation of formaldehyde. The capacitance and resistance value of different Zinc Oxide film thickness and different structure components irradiated by different wavelengths were measured by LCR. Finally, the green and red laser and LED lamps were used irradiate the components to observe the change of the capacitance value and the resistance value.

中文摘要 .........................i
英文摘要 .........................ii
誌謝 .........................iii
目錄 .........................iv
表目錄 .........................vi
圖目錄 .........................vii
第一章 緒論......................1
1.1 前言......................1
1.2 本文架構...................1
1.3 研究動機...................1
第二章 基礎理論...................2
2.1 壓電理論...................2
2.1.1壓電效應..............2
2.1.2壓電材料..............2
2.2 表面聲波...................2
2.3 表面聲波元件...............4
2.3.1中心頻率與聲波波速.....5
2.3.2插入損耗..............5
2.3.3機電耦合常數...........6
2.3.4延遲溫度係數...........6
2.4 氧化鋅介紹..................7
2.5 薄膜沉積....................7
2.5.1薄膜沉積方式...........8
2.5.2濺鍍原理...............8
2.5.3電漿...................8
2.5.4磁控濺鍍系統............8
2.5.5射頻濺鍍................9
2.5.6薄膜成長................9
2.6 光吸收機制...................11
2.7 光催化與氣體降解..............12
2.7.1光催化..................12
2.7.2甲醛及降解機制...........13
第三章 實驗步驟與實驗分析.............15
3.1 實驗流程......................15
3.2 表面聲波元件製作...............16
3.2.1黃光微影製程..............16
3.2.2氧化鋅粉靶製作.............19
3.2.3氧化鋅薄膜濺鍍.............20
3.3 實驗量測設備介紹................23
3.3.1場發射式電子顯微鏡.........23
3.3.2 X光繞射儀.................23
3.3.3螢光光譜儀.................24
3.3.4網路分析儀.................24
3.3.5函數產生器.................25
3.3.6能量散射光譜儀..............25
3.3.7甲醛監測儀..................25
3.4 元件之光催化檢測..................26
3.5 實驗藥品、儀器、耗材...............27
第四章 薄膜特性分析.......................29
4.1 氧化鋅薄膜分析.....................29
4.2 薄膜與光催化氣體降解................33
第五章 結果與討論.........................34
5.1 氧化鋅薄膜表面聲波元件分析與量測.....34
5.2 元件照紫外光之電阻與電容量測.........39
第六章 結論...............................50
參考文獻 ...................................51
Extended Abstract..........................54

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