臺灣博碩士論文加值系統

氧化鋅是一種用途廣泛且低成本的Ⅱ-Ⅵ族材料。本研究利用金奈米粒子吸附於氧化鋅奈米柱表面上，來提升場發射特性。首先使用水熱法生長氧化鋅奈米柱，接著使用直流濺鍍系統將金奈米粒子濺鍍於氧化鋅奈米柱表面上，最後通過熱退火的方式完成元件。
透過場發射掃描式電子顯微鏡(Field-Emission Scanning Electron Microscope，FE-SEM)、能量色散X射線譜(Energy Dispersive Spectrometer，EDS)、光致發光光譜(Photoluminescence，PL)、X光繞射分析(X-ray diffraction，XRD)、穿透式電子顯微鏡(Transmission Electron Microscopy，TEM)，觀察其奈米結構表面形貌、元素含量、光學特性以及結晶性。
研究結果發現，在純的氧化鋅奈米柱與金奈米粒子吸附氧化鋅奈米柱的場發射特性分析下，未照光的起始(Turn-on)電場分別為6.85(V/µm)和5.85(V/µm)，而增強因子(β)分別為700和1896.76。證明吸附金奈米粒子於氧化鋅奈米柱提升了場發射元件特性。

ZnO is a II-VI material with cheap and practical. In this study, the gold nanoparticles to enhance the field emission properties via adsorbed on the ZnO nanorods surface. The ZnO nanorods was grown by hydrothermal method, and the gold nanoparticles via DC sputter system to adsorbed on the surface, final obtain the field emission element via thermal annealing.
The surface morphology, element content, optical properties and crystallinity of the nanostructures were observed by the field-emission scanning electron microscope(FE-SEM), energy dispersive spectrometer(EDS), photoluminescence(PL), X-ray diffraction(XRD), transmission electron microscopy(TEM).
The results show the Turn-on fields are 6.85 and 5.85 (V/μm), while field enhancement factors (β) are 700 and 1896.76 for the pure zinc oxide nanorods and gold nanoparticles adsorbed zinc oxide nanorods. It is proved that the adsorption of gold nanoparticles on the zinc oxide nanorods enhances the characteristics of the field emission element.

摘要 ...i
Abstract ...ii
誌謝 ...iii
目錄 ...iv
表目錄 ...vi
圖目錄 ...vii
第一章 緒論 ...1
1.1 前言 ...1
1.2研究動機 ...2
第二章 文獻回顧 ...3
2.1氧化鋅奈米材料簡介 ...3
2.1.1晶體結構 ...3
2.1.2氧化鋅奈米結構 ...5
2.2薄膜成核成長理論 ...7
2.3氧化鋅奈米結構之合成方式 ...8
2.3.1化學氣相沉積法(Chemical Vapor Deposition，CVD) ...8
2.3.2熱蒸鍍法(Thermal evaporation) ...9
2.3.3水溶液法 (Aqueous solution method) ...10
2.3.4水熱法 (Hydrothermal method) ...11
2.4電子場發射特性 ...13
2.4.1場發射理論 ...13
2.4.2 Fowler-Nordheim 方程式 ...16
第三章 實驗步驟與量測設備分析 ...18
3.1實驗室藥品 ...18
3.2使用儀器介紹 ...19
3.2.1場發射掃描式電子顯微鏡(Field-Emission Scanning Electron Microscope，FE-SEM) ...19
3.1.2射頻磁控濺鍍系統(RF Magnetron Sputtering) ...20
3.1.3能量散佈分析儀(Energy Dispersive Spectrometer，EDS) ...22
3.1.4穿透式電子顯微鏡(Transmission Electron Microscopy，TEM) ...22
3.1.5 X射線繞射儀(X-ray diffraction，XRD) ...24
3.1.6光致發光(Photoluminescence，PL) ...25
3.1.7場發射量測系統 ( Field Emission measurement system ) ...26
3.2氧化鋅奈米柱實驗步驟 ...27
3.2.1玻璃基板清洗 ...28
3.2.2沉積氧化鋅晶種層 ...29
3.2.3氧化鋅奈米柱成長 ...30
3.2.4濺鍍金奈米粒子 ...32
3.2.5場發射量測 ...33
第四章 結果與討論 ...34
4.1氧化鋅奈米柱之材料分析 ...34
4.1.1氧化鋅奈米柱場發射電子顯微鏡分析 ...34
4.1.2金奈米粒子吸附氧化鋅奈米柱之能量散佈分析 ...37
4.1.3金奈米粒子吸附氧化鋅奈米柱之穿透式電子顯微鏡分析 ...38
4.1.4氧化鋅奈米柱之X光繞射分析 ...40
4.1.5氧化鋅奈奈米柱之光致發光分析 ...41
4.2場發射分析 ...42
4.2.1黑暗中之場發射分析 ...42
4.2.2照紫外光之場發射分析 ...44
4.2.3場發射之電流穩定度 ...45
第五章 結論 ...48
5.1結論 ...48
5.2未來展望 ...48
參考文獻 ...49
Exctended Abstract ...54

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