本論文提出一種將向列性液晶應用在具有布拉格光柵的非對稱聚合物波導結構濾波器，用來提升濾波的波長，濾波器主要的架構是由四個端點的非對稱布拉格耦合器(Asymmetric Bragg Coupler，ABC)以及布拉格光柵所組成，在製作過程中利用微機電技術(Micro-Electro-Mechanical-System，MEMS)使製作的元件能夠達到微小化，並使用黃光微影製程製作濾波器的非對稱布拉格耦合器結構，以及使用一種高分子有機矽化合物聚二甲基矽氧烷（Polydimethylsiloxane，PDMS）結合軟微影技術(soft lithography)、複製成形技術(replica molding)來複製結構，省略實驗中需重複使用黃光微影製程製作元件結構的過程，達到省時省成本的效果，並利用全像干涉微影技術製作布拉格光柵(Bragg Grating)，將光柵建立在非對稱布拉格耦合器的結構上，利用光柵的特性，達到濾波的功能，並將液晶結合在元件上，利用液晶的特性使非對稱聚合物波導的布拉格光柵濾波器的濾波效果更好更突出，並能使濾波的波常往上提升，在完成濾波器元件的製作後，透過量測系統量測元件的濾波結果，最後實驗結果可證明此元件在使用在濾波調整是可行的。

In this paper, an asymmetric polymer waveguide structure filter with a Bragg grating is applied to enhance the wavelength of the filter. The main structure of the filter is an asymmetric Bragg coupler with four endpoints (Asymmetric). Bragg Coupler (ABC) and Bragg grating, which use micro-electro-mechanical-system (MEMS) to make the fabricated components miniaturized and use the yellow lithography process to create asymmetrical filters. The structure of the Bragg coupler, and the use of a polymer organic bismuth compound polydimethylsiloxane (PDMS) combined with soft lithography and replica molding to replicate the structure, omitting the need for experimentation The process of fabricating the component structure by using the yellow lithography process is repeated, and the effect of saving time and cost is achieved. Bragg Grating is fabricated by using holographic interference lithography technology, and the grating is built on the structure of the asymmetric Bragg coupler, and the grating is utilized. Characteristics, achieve the filtering function, and combine the liquid crystal on the component The characteristics of the liquid crystal make the filtering effect of the Bragg grating filter of the asymmetric polymer waveguide better and more prominent, and the filtering wave can be raised upwards. After the filter element is completed, the measuring component is measured through the measuring system. The filtering results, the final experimental results can prove that this component is feasible in the use of filter adjustment.

摘要...............i
Abstract...............ii
誌謝...............iii
目錄...............iv
表目錄...............vi
圖目錄...............vii
符號說明...............viii
第一章 緒論...............1
1.1 研究背景...............1
1.2 研究動機與目的...............1
1.3 研究方法...............2
第二章 文獻探討...............3
2.1 光塞取多工器...............3
2.1.1 OADM原理...............3
2.1.2 OADM未來趨勢探討...............3
2.2 光纖布拉格光柵...............4
2.2.1 布拉格光柵簡介...............4
2.2.2 布拉格波長...............4
2.3 全像干涉微影技術...............5
2.3.1 全像干涉微影技術簡介...............5
2.3.2 全像干涉系統架構...............5
2.4 材料特性...............6
2.4.1 SU-8...............6
2.4.2 PDMS...............6
2.4.3 Liquid Crystal...............6
第三章 研究內容與方法...............8
3.1 非對稱布拉格耦合器簡介...............8
3.1.1 非對稱布拉格耦合器結構...............8
3.1.2 非對稱布拉格耦合器濾波原理...............8
3.2 非對稱波導結構製作...............10
3.2.1 基板清潔...............10
3.2.2 波導結構製作...............11
3.2.3 製作PDMS軟模複製與翻印波導結構...............13
3.3 布拉格光柵製作在非對稱波導結構上...............15
3.3.1 調整光柵週期...............15
3.3.2 雕刻布拉格光柵...............16
3.4 濾波元件製作...............19
3.4.1 製作PDMS軟模複製具有光柵的波導結構...............19
3.4.2 使用PDMS軟模翻印具有光柵的波導結構...............20
3.4.3 波導通道填入導光介質與包覆層...............22
3.4.4 研磨與拋光...............24
第四章 結果與討論...............28
4.1 光模態量測...............28
4.1.1 光模態量測系統...............28
4.1.2 光模態量測結果...............29
4.2 光穿透量測...............30
4.2.1 光穿透量測系統...............30
4.2.2 光穿透量測結果...............30
4.3 光反射量測...............31
4.3.1 光反射量測系統...............31
4.3.2 光反射量測結果...............31
第五章 結論與未來研究方向...............32
參考文獻...............33

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